Quantification of self-sputtering and implantation during pulsed laser deposition of gold

Perea, Á.; Gonzalo, J.; Budtz-Jørgensen, C.; Epurescu, G.; Siegel, J.; Afonso, Carmen N.; Garcı́a-López, J.

doi:10.1063/1.2988145

Cited by 26 publications

(29 citation statements)

References 20 publications

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“…Ions are the species in the laser induced plasma having the higher kinetic energies, [9][10][11] and considered responsible for sputtering or implantation at substrate level during pulsed laser deposition. 4,6,7 The ionization fraction is determined by the fluence and wavelength of the laser used for ablation.…”

Section: Introductionmentioning

confidence: 99%

Dynamics of ions produced by laser ablation of several metals at 193 nm

Baraldi

Perea

Afonso

2011

Journal of Applied Physics

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Influence of excited state spatial distributions on plasma diagnostics: Atmospheric pressure laser-induced He-H2 plasma J. Appl. Phys. 112, 083302 (2012) Characterizing the energy distribution of laser-generated relativistic electrons in cone-wire targets Phys. Plasmas 19, 103108 (2012) Verification of the physical mechanism of THz generation by dual-color ultrashort laser pulses Appl. Phys. Lett. 101, 161104 (2012) ORION laser target diagnostics Rev. Sci. Instrum. 83, 10D732 (2012) Target normal sheath acceleration sheath fields for arbitrary electron energy distribution Phys. Plasmas 19, 083115 (2012) Additional information on J. Appl. Phys. This work reports the study of ion dynamics produced by ablation of Al, Cu, Ag, Au, and Bi targets using nanosecond laser pulses at 193 nm as a function of the laser fluence from threshold up to 15 J cm À2 . An electrical (Langmuir) probe has been used for determining the ion yield as well as kinetic energy distributions. The results clearly evidence that ablation of Al shows unique features when compared to other metals. The ion yield both at threshold (except for Al, which shows a two-threshold-like behavior) and for a fixed fluence above threshold scale approximately with melting temperature of the metal. Comparison of the magnitude of the yield reported in literature using other wavelengths allows us to conclude its dependence with wavelength is not significant. The evolution of the ion yield with fluence becomes slower for fluences above 4-5 J cm À2 with no indication of saturation suggesting that ionization processes in the plasma are still active up to 15 J cm À2 and production of multiple-charged ions are promoted. This dependence is mirrored in the proportion of ions with kinetic energies higher than 200 eV. This proportion is not significant around threshold fluence for all metals except for Al, which is already 20%. The unique features of Al are discussed in terms of the energy of laser photons (6.4 eV) that is enough to induce direct photoionization from the ground state only in the case of this metal.

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Section: Introductionmentioning

confidence: 99%

Dynamics of ions produced by laser ablation of several metals at 193 nm

Baraldi

Perea

Afonso

2011

Journal of Applied Physics

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“…Therefore, more than half of the high flux refers to charged species bombarding the substrate with enough ions having energies well above 200 eV. 21 It is interesting to point out here that the charge emitted during electron-beam deposition of gold generated surface defects that acted as preferred nucleation sites for gold, 17 even when the flux was 3 orders of magnitude smaller than in the present work. Also, the use of ion beam deposition leads to intermediate values of the number density and thus an enhanced nucleation rate.…”

Section: Discussionmentioning

confidence: 55%

“…20͒ and that this average time varies little with fluence. 21 Assuming 10 s as a conservative approximation for the deposition time in our conditions as was earlier done in Ref. 8, the average flux calculated dividing the number of deposited atoms per pulse by this deposition time is in the range of 0.…”

Section: Discussionmentioning

confidence: 99%

“…It has recently been reported that the ionization fraction of the laser-produced gold plasma under similar fluence conditions than in this work is approximately 60%. 21 It contains in addition a similar number of electrons since the plasma should be neutral. Therefore, more than half of the high flux refers to charged species bombarding the substrate with enough ions having energies well above 200 eV.…”

Section: Discussionmentioning

confidence: 99%

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Role of substrate on nucleation and morphology of gold nanoparticles produced by pulsed laser deposition

et al. 2009

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This work compares the morphology of gold nanoparticles ͑NPs͒ produced at room temperature on singlecrystalline ͑MgO nanocubes and plates͒ and amorphous ͑carbon/glass plates͒ substrates by pulsed laser deposition ͑PLD͒. The results show that similar deposition and nucleation rates ͑Ͼ5 ϫ 10 13 cm −2 s −1 ͒ are achieved irrespective of the nature of the substrate. Instead, the shape of NPs is substrate dependent, i.e., quasispheres and faceted NPs in amorphous and single-crystalline substrates, respectively. The shape of the latter is octahedral for small NPs and truncated octahedral for large ones, with the degree of truncation being well explained using the Wulff-Kaichew theorem. Furthermore, epitaxial growth at room temperature is demonstrated for single-crystalline substrate. The large fraction of ions having energies higher than 200 eV and the large flux of species arriving to the substrate ͑10 16 at. cm −2 s −1 ͒ involved in the PLD process are, respectively, found to be responsible for the high nucleation rates and epitaxial growth at room temperature.

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“…These differences can be explained in relation to the nucleation processes of the laser ablated species that take place on the substrate. In fact, it has been proposed 14,28,29 that defects created during layer growth by the high energetic plasma species reaching the substrate are responsible of the nucleation process. At the initial state of deposition, the dominating island-like growth results in small coverage of the surface area by clusters.…”

Section: Discussionmentioning

confidence: 99%

Gold coating of micromechanical DNA biosensors by pulsed laser deposition

Rebollar

Sanz

Esteves³

et al. 2012

Journal of Applied Physics

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Low-temperature indium-bonded alkali vapor cell for chip-scale atomic clocks J. Appl. Phys. 113, 064501 (2013) Multi-layered dielectric cladding plasmonic microdisk resonator filter and coupler Phys. Plasmas 20, 020701 (2013) Micromachined piezoelectric microphones with in-plane directivity Appl. Phys. Lett. 102, 054109 (2013) Referee acknowledgment for 2012 Biomicrofluidics 7, 010201 (2013) Introducing a well-ordered volume porosity in 3-dimensional gold microcantilevers Appl. Phys. Lett. 102, 053501 (2013) Additional information on J. Appl. Phys. In this work, we describe the gold-coating of silicon microcantilever sensors by pulsed laser deposition (PLD) and their performance as DNA biosensors. To test optimum deposition conditions for coating the sensors, silicon substrates were gold coated by PLD using the fifth harmonic of a Nd:YAG laser (213 nm, pulse duration 15 ns). The gold deposits were characterized by atomic force microscopy and x-ray diffraction. The adequate conditions were selected for coating the sensors with a 20 nm thick gold layer and subsequently functionalized with a selfassembled monolayer of thiolated DNA. To verify PLD as a tool for gold coating of biomechanical sensors, they were characterized by using a scanning laser analyzer platform. Characterization consisted in the measurement of the differential stress of the cantilevers upon hydration forces before and after functionalization with a double-stranded DNA monolayer. The measurements showed that the sensor surface stress induced by the adsorption of water molecules is approximately seven times higher than that of functionalized sensors gold coated by thermal evaporation. These results indicate that gold coating by PLD could be an advantageous method to enhance the response of biomechanical sensors based on gold-thiol chemistry. V C 2012 American Institute of Physics. [http://dx

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Quantification of self-sputtering and implantation during pulsed laser deposition of gold

Cited by 26 publications

References 20 publications

Dynamics of ions produced by laser ablation of several metals at 193 nm

Dynamics of ions produced by laser ablation of several metals at 193 nm

Role of substrate on nucleation and morphology of gold nanoparticles produced by pulsed laser deposition

Gold coating of micromechanical DNA biosensors by pulsed laser deposition

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