Quantification of two-dimensional structures generalized for OPC model verification

Shi, Xuelong; Chen, J. Fung; Broeke, Doug Van Den; Hsu, Stephen; Hsu, Michael

doi:10.1117/12.713867

Cited by 1 publication

(2 citation statements)

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“…The model calibrated using wafer data from patterns mentioned above can characterize the linearity, proximity responses of test patterns. One concept "imaging signal space" was proposed in the literature [8]. In reality, the aim of modeling is trying to construct such a self-contained "imaging signal space" as possible.…”

Section: Test Patterns Designmentioning

confidence: 99%

“…And it is shown that one must be certain that an OPC model is calibrated to a sufficiently broad set of feature types, widths, and spaces. One methodology to quantify any structure for model calibration was proposed [8]. By translating the test structures and geometrical design rules into imaging signal space and defined their corresponding structural space boundary.…”

Section: Introductionmentioning

confidence: 99%

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An Investigation on OPC Model Coverage to Improve CD Uniformity

Wang

Zhang

et al. 2014

ECS Trans.

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Model-based Optical Proximity Correction (model-based OPC) has become a necessity for state of the art IC fabrication at advanced node technology. It needs one “reliable” OPC model for successful application of model-based OPC. Namely, the reliable OPC model needs to have much wider coverage and high accuracy to characterize the physical processes that take place during the photoresist exposure and development. One of the key factors for reliability of OPC model is model coverage which depends strongly on test pattern samples for model calibration. In this paper, two sets of test structures were selected to do OPC model calibration to qualify CD uniformity of patterns in array structures at 3xnm technology node. The results show the intermediate number of features for a given pitch is necessary for wider coverage of OPC model. The model including such patterns can improve CD uniformity of array structure. One methodology to design optimal permutation and combination for test patterns is proposed.

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Section: Test Patterns Designmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%