2013
DOI: 10.1117/2.1201303.004785
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Quantifying inhomogeneities in silicon-rich oxide thin films

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Cited by 2 publications
(1 citation statement)
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“…[47,48,49,50] In the case of glass forming oxides, this approach acts as a reasonable mimic of the experimental glass production process, albeit with a significantly higher cooling rate than achieved experimentally. [51] This approach has been applied to a-SiO 2 more than any other material, with a variety of objectives, such as structure prediction, defect characterization, kinetics of defect processes, and modeling of interfaces with other materials. [52,53,54,55,56,57] These approaches have produced structures that have been used to successfully identify defect centers, breakdown mechanisms, and many more atomistic phenomena.…”
Section: Introductionmentioning
confidence: 99%
“…[47,48,49,50] In the case of glass forming oxides, this approach acts as a reasonable mimic of the experimental glass production process, albeit with a significantly higher cooling rate than achieved experimentally. [51] This approach has been applied to a-SiO 2 more than any other material, with a variety of objectives, such as structure prediction, defect characterization, kinetics of defect processes, and modeling of interfaces with other materials. [52,53,54,55,56,57] These approaches have produced structures that have been used to successfully identify defect centers, breakdown mechanisms, and many more atomistic phenomena.…”
Section: Introductionmentioning
confidence: 99%