1985
DOI: 10.1016/s0039-6028(85)80016-9
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Quantitative auger electron analysis of titanium nitrides

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Cited by 139 publications
(13 citation statements)
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“…A low energy (500 eV) argon beam is used to improve the depth resolution (∼2 nm) and minimize sputter-induced artefacts. [11].…”
Section: Backside Versus Frontside Tof-sims and Auger Depth Profilingmentioning
confidence: 99%
“…A low energy (500 eV) argon beam is used to improve the depth resolution (∼2 nm) and minimize sputter-induced artefacts. [11].…”
Section: Backside Versus Frontside Tof-sims and Auger Depth Profilingmentioning
confidence: 99%
“…Much work has of been undertaken to establish a simple and accurate method for the determination of the composition of TiNx Films. Many techniques, principally Auger Elec tron Spectroscopy (AES), X-ray Photoelectron Spec troscopy (XPS), Rutherford Backscattering Spectros copy (RBS) and Energy Dispersive X-ray Analysis (EDX) have been considered [1][2][3][4][5][6][7][8]. None of the techReprint requests to Dr. J. Haupt.…”
Section: Introductionmentioning
confidence: 99%
“…EDX also has a large escape depth and this, combined with the overlap of the Ti LI and N Ka lines and the low probability of the N Ka emission causes difficulties with quantification. The more surface sensitive electron spectroscopic techniques are normally prefered for thin film analysis, but for TiNx problems of peak overlap and peak fit ting in AES and XPS, respectively, have resulted in many different approaches [1,2,5,6,8]. For XPS, the unusual structure in the Ti 2p region between the Ti 2p1/2 and Ti 2p3/2 lines has been ascribed to satel lite structure or the presence of oxygen which varies as a function of N concentration, causing uncertainties in the peak area measurements [1,[6][7][8].…”
Section: Introductionmentioning
confidence: 99%
“…Several quanti-fication schemes have been proposed to derive the N component from the overlapping transitions at Ϸ385 eV using the Ti Auger emission peak height at Ϸ418 eV. 14,15 The analysis result using the approach proposed by Dawson and Tzatzov 15 indicates that our TiN films are nearly stoichiometric.…”
mentioning
confidence: 98%
“…Quantitative chemical analysis of titanium nitrides by AES is complicated by the fact that the main KL 23 L 23 Auger electron emission from nitrogen occurs at an energy that overlaps the L 3 M 23 M 23 transition from titanium at Ϸ385 eV. 14,15 Since there are no N Auger transitions above 400 eV, the Auger emission at Ϸ418 eV arises solely from the Ti L 3 M 23 M 45 transition. Therefore, this transition can represent the Ti intensity and chemical fingerprinting for titanium nitride.…”
mentioning
confidence: 99%