Quantitative surface chemical mapping with Auger and backscattered electron signals

Prutton, M.; Barkshire, I. R.; Crone, M.

doi:10.1016/0304-3991(95)00017-u

Cited by 13 publications

(5 citation statements)

References 24 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…For the contrast of such a system the topographic factor may also be a main source of contrast of an AE image. For quantitative surface chemical mapping, it is intended to reduce the artifacts by reducing topographical contrast and revealing otherwise hidden chemical contrast (Prutton et al, 1995). However, there are still no confirmed conclusions about the effect of each factor till now.…”

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

Monte Carlo Simulation of SEM and SAM Images

Li¹,

Mao²,

Ding³

2011

Applications of Monte Carlo Method in Science and Engineering

View full text Add to dashboard Cite

Section: Resultsmentioning

confidence: 99%

“…But, the quantitative mapping is quite difficult because some artifact signals (Prutton et al, 1995) can be produced in a complex process of electron beam interaction with a sample in addition to its disadvantages in the low signal-to-noise ratio, low spatial resolution and low energy resolution.…”

Section: Simulation Study Of Scanning Auger Electron Imagesmentioning

confidence: 99%

Monte Carlo Simulation of SEM and SAM Images

Li¹,

Mao²,

Ding³

2011

Applications of Monte Carlo Method in Science and Engineering

View full text Add to dashboard Cite

“…44 Jumping ahead a little, these samples have continued to be extremely useful to characterize the dependence on topography of a variety of scattering processes and to test the efficacy of various methods to minimize the contrast in Auger images that can result on a rough surface. 45 The unwanted topographical contrast can be almost eliminated by collecting several images for subsequent processing. One requires images at the Auger peak energy, above the Auger peak energy and at ¾2000 eV.…”

Section: The Construction Of Mulsammentioning

confidence: 99%

From LEED to MULSAM

Prutton

2000

Surf. Interface Anal.

View full text Add to dashboard Cite

This account gives an outline of the work done in the Department of Physics, University of York since 1965. The Surface Physics Group has been particularly active in the development and application of electron probes of solid surfaces with strong emphasis upon low‐energy electron diffraction and scanning electron microscopy using Auger electrons to form images. A scanning Auger microscope using multi‐imaging (MULSAM) has been particularly fruitful for the study of a variety of heterogeneous materials. Examples are given of the application of MULSAM to the minimization of topographic contrast artefacts, to the study of multilayers of magnetic materials, to the characterization of very rough PtRh catalyst surfaces, to the interpretation of the shapes of electron spectra and to the angular dependence of both Auger electron and energy‐dispersive x‐ray signals. Copyright © 2000 John Wiley & Sons, Ltd.

show abstract

“…The procedures of data processing of energy analysed and backscattered electron images in order to reduce artefacts arising from topography, sub-surface composition variations and sharp edges has been reviewed recently by Prutton et ab [71] where the same sample is used to demonstrate the effects upon image contrast of the various ratios and correlations outlined above. The simple ratio methods outlined above can reduce contrast artefacts to the level of a few percent of the average image brightness but the best approach uses the same ratio but corrects it by a small factor proportional to the effective atomic number of the substrate at each pixel location [72].…”

Section: Backscattered Electronmentioning

confidence: 99%

Microanalytical Imaging with Auger Electrons

Prutton

1995

Microsc. Microanal. Microstruct.

View full text Add to dashboard Cite

Abstract. 2014 The detection of Auger electrons in a scanning electron microscope in order to form chemically specific images of the surfaces of solids is reviewed. The limits to sensitivity and spatial resolution are described and the current 'state of the art' is summarised. Some of the useful image processing tools are reviewed and then a small set of applications of the technique when used for the study of surface segregation, semiconducting devices and archaeology are described.

show abstract

Quantitative surface chemical mapping with Auger and backscattered electron signals

Cited by 13 publications

References 24 publications

Monte Carlo Simulation of SEM and SAM Images

Monte Carlo Simulation of SEM and SAM Images

From LEED to MULSAM

Microanalytical Imaging with Auger Electrons

Contact Info

Product

Resources

About