Conference on Precision Electromagnetic Measurements 1988
DOI: 10.1109/cpem.1988.671305
|View full text |Cite
|
Sign up to set email alerts
|

Quantized Hall Resistance Measurements

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
3
0

Year Published

1993
1993
2001
2001

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(3 citation statements)
references
References 3 publications
0
3
0
Order By: Relevance
“…In a direct comparison Hartland et al [35] found that the difference between the QHR in the two device types was smaller than 3.5 parts in 10 10 . However, at about the same time, several other groups [36,37,38] reported anomalous values of the QHR measured in a particular Si-MOSFET device. The authors claimed to see differences in R H up to several parts in 10 7 despite the absence of any measured dissipation within the experimental resolution.…”
Section: Universality Of the Qhrmentioning
confidence: 96%
“…In a direct comparison Hartland et al [35] found that the difference between the QHR in the two device types was smaller than 3.5 parts in 10 10 . However, at about the same time, several other groups [36,37,38] reported anomalous values of the QHR measured in a particular Si-MOSFET device. The authors claimed to see differences in R H up to several parts in 10 7 despite the absence of any measured dissipation within the experimental resolution.…”
Section: Universality Of the Qhrmentioning
confidence: 96%
“…In 1988, however, Kawaji et ai. [2] reported measurements of flat plateaus in Si-MOSFETs that were offset from the GaAs heterostructure value by 0.16 ppm. These samples satisfied all known criteria for standards quality devices including having Pxr values smaller than 0.015 ppm of the Hall resistance, a value not expected to shift the plateau by more than 0.003 ppm On the other hand, Delahaye and Bournaud [8) reported no anomalies in their examination of a similar Sony sample.…”
Section: Offset Plateausmentioning
confidence: 99%
“…In contrast to the Josephson voltage steps which have no observed material-dependent corrections, the quantum Hall plateaus are not only temperature and current dependent [1], but also are not necessarilyflat even when no significant longitudinal resistance is measured [2][3]. Furthermore, imperfections in the contacts can lead to contact-dependent corrections to the Hall resistance [4].…”
Section: Introductionmentioning
confidence: 99%