High-quality Bi2Se3 thin films
with topological
insulating properties at room temperature have recently attracted
much attention as one of the promising materials for realizing innovative
electronic and optoelectronic devices. Here, we report the high crystallinity
growth of Bi2Se3 thin films on a patterned sapphire
substrate (PSS) by using a vapor-phase transport deposition with minimizing
thermal dissociation of Se atoms vaporized in Bi2Se3 powder. This PSS not only reduces the large dislocation of
heterogeneously grown Bi2Se3 on a sapphire substrate
but also induces enhanced light absorption in the visible to near-infrared
(IR) ranges compared to Bi2Se3 on planar sapphire
substrates. Thus, the Bi2Se3 thin film laterally
grown on the PSS reveals uniform surface properties and high crystallinity
in the rhombohedral lattice phase with a full width at half maximum
of 0.06 ° for the XRD (003) peak. Also, the photoresponse of
the fabricated IR conversion device using Bi2Se3/PSS heterostructure exhibits excellent performance and high reliability
with no degradation after continuous switching. As a result, the device
constructed with the Bi2Se3/PSS exhibits one
order of magnitude higher NIR induced-photocurrent and 1–2
orders of magnitude faster photo-switching than that with Bi2Se3/Al2O3. Such an enhancement in
the device performance of Bi2Se3/PSS is confirmed
by the increased absorption spectra in visible and NIR ranges and
the improved light absorption distribution.