“…Besides the defect insensitivity, , QDs have numerous performance advantages over QWs, including lower threshold current, higher temperature operation, a near zero line width enhancement factor and, thus, isolator-free stability, ultrafast gain recovery, and enhanced four-wave mixing. Exciting technological advances have been made in the field of epitaxially grown QD devices on Si, as described in several previous review articles, summarizing the evolution of device performance, and efforts in developing CMOS compatible epitaxial platform on (001) Si. ,− …”