1987
DOI: 10.1364/ao.26.005284
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Quantum efficiency stability of silicon photodiodes

Abstract: The stability of the quantum efficiency of inversion layer, phosphorus-diffused (n on p), and boron-diffused (p on n) photodiodes has been investigated. Unsatisfactory silicon-silicon dioxide interfaces, latent recombination centers in the diffused layers, and moisture absorption by the device were identified as possible causes of instability. Diodes were fabricated using processes in which these sources of instability were carefully controlled. The resulting diodes were subjected to various accelerated aging … Show more

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Cited by 145 publications
(63 citation statements)
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“…As noted above (see Fig. 7), c-Si does not show significant impact ionization for photon energies within the range of the solar spectrum [46,49]. Device modeling indicates that a hypothetical c-Si solar cell, operating with efficient impact ionization such that every absorbed photon at or above 2E g produced two electron-hole pairs, would reduce the power loss to heat from 47% to 39% while increasing the electrical power from 33% to 41%.…”
Section: Carrier-carrier and Carrier-lattice Interactions In Bulk Semmentioning
confidence: 76%
“…As noted above (see Fig. 7), c-Si does not show significant impact ionization for photon energies within the range of the solar spectrum [46,49]. Device modeling indicates that a hypothetical c-Si solar cell, operating with efficient impact ionization such that every absorbed photon at or above 2E g produced two electron-hole pairs, would reduce the power loss to heat from 47% to 39% while increasing the electrical power from 33% to 41%.…”
Section: Carrier-carrier and Carrier-lattice Interactions In Bulk Semmentioning
confidence: 76%
“…The detectors for the SXP are silicon XUV photodiodes that are available commercially and discussed in detail by Korde and Geist [1987], Korde et al [1988], and Canfield et al [1994]. Their response at short wavelengths is near the theoretical response for silicon.…”
Section: Instrumentationmentioning
confidence: 99%
“…After the standard p+ channel stop and n+ guard ring diffusion, phosphorous diffusion was carried out to achieve zero surface recombination without a diffused dead region [3]. The passivating silicon dioxide coating was thinned down to 80 A after completion of the phosphorous diffusion.…”
Section: -450gmentioning
confidence: 99%