1997
DOI: 10.4028/www.scientific.net/ddf.143-147.1003
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Quantum-Well Boron and Phosphorus Diffusion Profiles in Silicon

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Cited by 24 publications
(11 citation statements)
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“…40 The competitive diffusion of probably neutral vacations and/or interstitials from a-SiO 2 to Si at the a-SiO 2 /Si boundary is a hot question of shallow dopation of silicon. 41,42 The CC approach permits to transfer the results obtained for crystalline SiO 2 to a-SiO 2 and to work with a wide range of the OÀ ÀSiÀ ÀO geometries. The SiÀ ÀO distance and SiÀ ÀOÀ ÀSi angle of a-SiO 2 , simulated by the usual computational approach, 43 is in agreement with the experiment 44 and corresponds to 1358 with average deviation of 158, while average SiÀ ÀO distance is 1.61 Å .…”
Section: Discussionmentioning
confidence: 99%
“…40 The competitive diffusion of probably neutral vacations and/or interstitials from a-SiO 2 to Si at the a-SiO 2 /Si boundary is a hot question of shallow dopation of silicon. 41,42 The CC approach permits to transfer the results obtained for crystalline SiO 2 to a-SiO 2 and to work with a wide range of the OÀ ÀSiÀ ÀO geometries. The SiÀ ÀO distance and SiÀ ÀOÀ ÀSi angle of a-SiO 2 , simulated by the usual computational approach, 43 is in agreement with the experiment 44 and corresponds to 1358 with average deviation of 158, while average SiÀ ÀO distance is 1.61 Å .…”
Section: Discussionmentioning
confidence: 99%
“…Great opportunities to produce different types of self-ordering nanostructures such as quantum wires and crystallography-oriented quantum dot systems are provided by means of a method of molecular beam epitaxy [180], as well as ion implantation and non-equilibrium impurity diffusion methods [181]. As the method of atomic layer deposition (ALD) [182], they are widely applied in modern technology of semiconductors and nanoelectronics in the synthesis of other functional materials in planar technology [183][184][185].…”
Section: Fig 16 the Distribution Of Stationary (A) And Flash (B) Mamentioning
confidence: 99%
“…1 021 cm3 can be achieved (Fig.2). Cyclotron resonance studies and currentvoltage (CV) measurements performed at different angles between the diffusion profile plane and the bias voltage have shown that such p-diffusion profiles consist predominantly of the SLQW (Fig.3) [1,2]. The dynamic quantum wires and dots have been revealed by the quantized conductance (QC), EPR-EDEPR and NMR methods at the edges of the SLQW, which are created by the electrostatic ordering of the dipole negative-U centres [2].…”
Section: Introductionmentioning
confidence: 99%
“…Self-assembly longitudinal silicon quantum wells (SLQW) are naturally formed inside the ultra-shallow ptdiffusion profiles prepared using non-equilibrium boron diffusion into the n-type silicon (1 00)-wafers [1]. By varying the parameters of the surface oxide overlayer, the Cl levels in the gas phase and diffusion temperature which adjust the excess fluxes of selfinterstitials and vacancies emerging from monocrystalline surface, it was possible to define both the kick-out and dissociative vacancy mechanism of the non-equilibrium impurity diffusion (Fig.…”
Section: Introductionmentioning
confidence: 99%