1990
DOI: 10.1063/1.102814
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Quarter-wave Bragg reflector stack of InP-In0.53Ga0.47As for 1.65 μm wavelength

Abstract: Quarter-wave semiconductor mirrors of InP-In0.53Ga0.47As for high reflectivity at 1.65 μm wavelength are epitaxially grown using metalorganic chemical vapor deposition. Doping of the In0.53Ga0.47As layers is found to be critical for high reflectivity at wavelengths corresponding to the In0.53Ga0.47As band gap. n-type doping reduces the band-to-band absorption resulting in high reflectivity while p-type doped mirrors show reduced reflectivity.

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Cited by 24 publications
(12 citation statements)
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“…It is interesting to note that a similar effect in the Moss-Burstein shift has been observed by Deppe et al 29 in highly doped bulk In 0.53 Ga 0.47 As layers. For p-type doping no appreciatable Moss-Burstein shift was found, while in n-type layers a significant shift was observed.…”
Section: B Numerical Results and Discussionsupporting
confidence: 82%
“…It is interesting to note that a similar effect in the Moss-Burstein shift has been observed by Deppe et al 29 in highly doped bulk In 0.53 Ga 0.47 As layers. For p-type doping no appreciatable Moss-Burstein shift was found, while in n-type layers a significant shift was observed.…”
Section: B Numerical Results and Discussionsupporting
confidence: 82%
“…The calculated separation between Fermi level and the top of the valence band for intercalated samples reaches B1 eV, consistent with our experimental observation. Unlike previous studies 33,34 with small shifts in a very narrow energy range by regular doping, the ultra-large shift due to Cu intercalation here enables dramatic optical property change over a large wavelength range, thus makes such a material system suitable for applications that require substantial optical property tuning. Figure 4a shows the refractive indices obtained from the experimental data.…”
Section: Resultsmentioning
confidence: 89%
“…This is reasonable since a rigid shift of the absorption edge with doping can be expected in materials where band filling occurs, especially at low temperatures, and such shifts have been observed, for example, in n-GaAs 40 and n-InGaAs. 41 This new model, which includes reabsorption, was applied to the experimental PL measurements of sample S5. The Fermi level (E F ϪE c ) was fixed to the value calculated from the Hall carrier concentration, i.e., 97 meV at RT and 104 meV at LT.…”
Section: A Reabsorption Effects On the Photoluminescence Spectramentioning
confidence: 99%