Quartz micromachining using laser plasma soft x raysand ultraviolet laser light

Makimura, Tetsuya; Mitani, Shinjo; Kenmotsu, Youichi; Murakami, Kouichi; Mori, M.; Kondo, Kiminori

doi:10.1063/1.1782265

Cited by 48 publications

(22 citation statements)

References 25 publications

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“…Thus, previous research was focused on alternative methods of inducing absorption, or on methods using femtosecond lasers. The alternative methods of inducing absorption include irradiation by vacuum UV light [5] or soft X-rays [6], contact with a laser plasma [7], and the application of solutions to the workpiece [8].…”

Section: Micromachining Of Transparent Materialsmentioning

confidence: 99%

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Makimura

Fujimori

Torii

et al. 2011

Elect Comm in Japan

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SUMMARYSilica glass can be ablated using focused laser plasma soft X-rays. The ablation technique enables us to fabricate trenches with a width as narrow as 50 nm. In the present paper, we have investigated the nano-ablation process. The soft X-ray irradiation causes a silica surface broken into almost atomic species. Ionic species have kinetic energies higher than that gained by heating to the boiling point. We measured the ablation depth as a function of the soft X-ray fluence. The depth analysis revealed that soft X-rays are absorbed in a silica surface with an effective absorption depth of 10 nm. The result indicates that the energy density of the soft X-rays per unit volume at the threshold fluence is comparable to that required for breaking silica glass into atomic species. Further, the results suggest that ablation occurs before diffusion of absorbed energy into the surrounding region. In addition to energy absorption, repulsive forces between ionic species may cause ablation of the silica surface by soft X-ray irradiation. These properties of soft X-ray ablation may make possible the nano-ablation of silica glass.

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Section: Micromachining Of Transparent Materialsmentioning

confidence: 99%

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Makimura

Fujimori

Torii

et al. 2011

Elect Comm in Japan

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“…In such cases low or moderate energy lasers working at 10 Hz or lower repetition rate are employed [10][11][12][13]. SXR or EUV sources based on such lasers are equipped with specialized collectors allow− ing for efficient focusing of the radiation to a spot with dimensions comparable to the plasma size.…”

Section: Introductionmentioning

confidence: 99%

Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

Bartnik

2015

Opto-Electronics Review

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In this work a review of investigations concerning interaction of intense extreme ultraviolet (EUV) and soft X-ray (SXR) pulses with matter is presented. The investigations were performed using laser-produced plasma (LPP) EUV/SXR sources based on a double stream gas puff target. The sources are equipped with dedicated collectors allowing for efficient focusing of the EUV/SXR radiation pulses. Intense radiation in a wide spectral range, as well as a quasi-monochromatic radiation can be produced. In the paper different kinds of LPP EUV/SXR sources developed in the Institute of Optoelectronics, Military University of Technology are described.Radiation intensities delivered by the sources are sufficient for different kinds of interaction experiments including EUV/SXR induced ablation, surface treatment, EUV fluorescence or photoionized plasma creation. A brief review of the main results concerning this kind of experiments performed by author of the paper are presented. However, since the LPP sources cannot compete with large scale X-ray sources like synchrotrons, free electron lasers or high energy density plasma sources, it was indicated that some investigations not requiring extreme irradiation parameters can be performed using the small scale installations. Some results, especially concerning low temperature photoionized plasmas are very unique and could be hardly obtained using the large facilities.

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“…The laser based techniques can be divided into direct and indirect techniques. In the direct methods infrared and far ultraviolet lasers (CO 2 [6], F 2 [7][8]), soft X-ray beam [9] and femtosecond pulses [8,10] can be used for etching. Although the CO 2 laser is applied in industrial environments, but the reachable resolution is some ten micrometer (due to its long wavelength (10.6 μm) and thermal based material removal), which is not sufficient for microoptical applications.…”

Section: Introductionmentioning

confidence: 99%

Interpretation and Modeling of Laser-Induced Backside Wet Etching Procedure

Vass

Budai

Schay

et al. 2010

JLMN

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Laser-induced backside wet etched fused silica surfaces were characterized by X-ray photoelectron spectroscopy (XPS) and ellipsomerty, and a new numerical model was developed to interpret the etching procedure on the basis of our recent results. ArF and KrF lasers were used for etching, while the applied liquid absorbers were naphthalene/methyl-methacrylate and pyrene/acetone solutions. The XPS measurements showed that the completely cleaned, etched fused silica surface layers were contaminated by carbon (which originated from the organic absorber molecules). The optical parameters of the modified layers were measured by spectroscopic ellipsometer. The thicknesses of these carbon contaminated layers were very thin (between 10 and 30 nm), while their absorption coefficient and the refractive index at 248 nm were between 100 000 and 180 000 cm -1 , and 1.85, respectively. Our previous numerical model was completed on the basis of the determined properties of this modified layer, and our results proved that this layer plays key role in the etching procedure.

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Quartz micromachining using laser plasma soft x raysand ultraviolet laser light

Cited by 48 publications

References 25 publications

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Ablation of silica glass induced by laser plasma soft X‐ray irradiation

Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

Interpretation and Modeling of Laser-Induced Backside Wet Etching Procedure

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