1983
DOI: 10.1002/pssa.2210760129
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Radiation damage in ion-implanted quartz crystals. Part I: Nuclear and electronic energy deposition

Abstract: The disorder formation in quartz crystals by implantation of He+, B+, and Ar+ ions at room temperature is investigated by Rutherford‐backscattering spectrometry (RBS). The efficiency of the process of damage production is strongly dependent on the energy deposition mechanism and the degree of disorder. Three characteristic stages of defect formation are found in dependence on nuclear deposited energy density Gn: (I) Point defects are produced at Gn ≦ 1 × 1020 keV/cm3. (II) Amorphous microregions are generated … Show more

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Cited by 29 publications
(18 citation statements)
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“…It is widely used in engineering applications, e.g., in construction materials, semiconductors, integrated optics, ultrasonic devices, etc. [1][2][3][4][5]. Many of these applications require the material to withstand exposure to radiations.…”
Section: Introductionmentioning
confidence: 99%
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“…It is widely used in engineering applications, e.g., in construction materials, semiconductors, integrated optics, ultrasonic devices, etc. [1][2][3][4][5]. Many of these applications require the material to withstand exposure to radiations.…”
Section: Introductionmentioning
confidence: 99%
“…Numerous experimental studies have been conducted to assess the nature and extent of damage induced in quartz by various types of irradiations, and often using neutrons and different types of ions [1,5,[9][10][11][12][13]. It is generally admitted that different types of irradiation result in similar damage to the atomic structure [12].…”
Section: Introductionmentioning
confidence: 99%
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“…The nature of the local disorder was not determined. Fischer et al [1983a] also studied the formation of disorder in quartz. They used RBS to investigate the degree of disorder by implantation of He'*', B'*', and…”
Section: Amorphization Wittels and Sherrillmentioning
confidence: 99%