A shift in threshold voltage caused by total ionizing dose (TID) is problematic in a MOSFET, especially in aerospace applications. Unlike traditional methods to minimize damage from TID, in this study a novel electro-thermal annealing (ETA) method to cure the TID induced damage is demonstrated for the first time. In this concept, conventional hardening or shielding techniques are not used. In a gate-all-around (GAA) MOSFET structure, dual gate electrodes were employed as an embedded nanowire-heater to generate localized Joule heat, which can anneal insulating layers, including gate oxide and spacer. With the Joule heat, trapped positive charges produced by the TID were neutralized within 200 ms. A damaged device with a radiation induced threshold voltage shift was repaired to the level of a fresh pristine device.