“…The gate oxide of the devices under consideration is particularly thin; consequently, the effect of holes trapping within the gate oxide is considerably small [20]. The created interface traps that have energy levels within the silicon bandgap contribute to the processes of charge carriers (electrons/holes), emission (generation), and capture (recombination), which leads to an increase in the pixel dark current [29]. The rate of charge carrier recombination (per unit volume per unit time) can be expressed according to the Shockley-Hall-Read (SHR) theory by the following equation [32]: (1) where and are the hole and electron capture cross-sections, respectively, is the (interface) trap density, is the (interface) trap energy level, is the intrinsic Fermi level, and are the hole and electron concentrations, respectively, is the intrinsic carrier concentration, is Boltzmann's constant, is the absolute temperature, and is the carrier thermal velocity, which is given by the following equation [32]: (2) where is the conductivity effective mass.…”