Titanium oxide films are barriers to the reactive oxygen etching of photoresists in silicon device fabrication. Medium-sized clusters of Ti oxide-alkoxide have been isolated by Klemperer et al. as intermediates in the formation of sol-gels from Ti tetraalkoxides and water. We report that one of the clusters, Ti11013 (OiPr)ls, reacts with diols in hydrocarbon solvents to form network cluster polymers. These polymers form thin films of Ti-rich material that can be pyrolyzed to the anatase form of TiOa. Chemisorption of these cluster polymers onto the surfaces of poly(vinylbenzy1phosphonic acid) copolymers (Macromolecules 1995,28, 110) gives thin coatings with significant etch resistance.