The adsorption of formaldehyde (H2CO) on clean Cu(100) at 85 K has been studied using electron energy
loss spectroscopy (EELS), X-ray photoelectron spectroscopy (XPS), and temperature-programmed desorption
(TPD). For coverages up to (1.06 ± 0.22) × 1015 H2CO molecules/cm2, formaldehyde spontaneously
polymerized to form a monolayer of disordered poly(oxymethylene) (POM), arranged with the chain directions
parallel to the surface plane. Thermal decomposition/desorption of the polymer monolayer occurred by three
routes, producing peaks in temperature-programmed desorption (TPD) at approximately 177, 200, and 215
K. The lowest temperature peak was exclusively associated with production of H2 and CO in approximately
equal proportions. The two higher temperature peaks were produced by molecular H2CO generated via depolymerization of the polymer. The 200 and 215 K features displayed zero- and first-order desorption kinetics,
corresponding to estimated activation energies for depolymerization of 75 ± 10 and 53.9 ± 0.5 kJ/mol,
respectively. The presence of two polymer desorption peaks is attributed to chain conformational differences
present within the monolayer and has not been previously observed in studies of formaldehyde adsorption on
metal surfaces. Large exposures of H2CO on this surface formed multilayers of molecular formaldehyde on
top of the first polymer layer. The second layer desorbed at 105 K and subsequent layers at ∼100 K.