2004
DOI: 10.1016/j.mseb.2003.09.037
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Raman and photoluminescence properties of Ge nanocrystals in silicon oxide matrix

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Cited by 36 publications
(17 citation statements)
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“…Our observed intense blue band centered at 3.26 eV is not the same as 3.1 eV band emitted under lower energy excitation reported by others [48,49]. Direct exciton radiative recombination responsible for this emission is not possible because the photon-absorption and photoexcitation take place inside the Ge nanoislands [48] and the observed blue emission displays significant size dependence. However, other mechanisms such as defects related luminescent centers in the matrix and interface reaction responsible for the occurrence of the weak peak around ∼2.84 eV.…”
Section: Annealing Temperaturesupporting
confidence: 45%
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“…Our observed intense blue band centered at 3.26 eV is not the same as 3.1 eV band emitted under lower energy excitation reported by others [48,49]. Direct exciton radiative recombination responsible for this emission is not possible because the photon-absorption and photoexcitation take place inside the Ge nanoislands [48] and the observed blue emission displays significant size dependence. However, other mechanisms such as defects related luminescent centers in the matrix and interface reaction responsible for the occurrence of the weak peak around ∼2.84 eV.…”
Section: Annealing Temperaturesupporting
confidence: 45%
“…Furthermore, for the longer annealing time the silicon interdiffusion is the main coarsening mechanism that causes decrement in the compressive stress, which shifts the peak to a lower energy value [46,47]. Our observed intense blue band centered at 3.26 eV is not the same as 3.1 eV band emitted under lower energy excitation reported by others [48,49]. Direct exciton radiative recombination responsible for this emission is not possible because the photon-absorption and photoexcitation take place inside the Ge nanoislands [48] and the observed blue emission displays significant size dependence.…”
Section: Annealing Temperaturesupporting
confidence: 41%
“…In another study on deposited Ge-doped SiO 2 films, a broad Raman peak at 270 cm 1 , characteristic of amorphousGe, was found, which evolved into an asymmetric sharper peak at 300 cm 1 upon annealing at above 700°C. 109 The nanocrystallite size, estimated from the fitting of the Raman spectra, was found to increase from 4 to 11 nm upon annealing at different temperatures.…”
Section: Monoatomic Systemsmentioning
confidence: 97%
“…This shift can be attributed to the quantum confinement effect, which was also observed from Ge nanocrystals embedded in SiO2 matrix. 26) The mean grain size of Ge nanoparticles can be estimated by the peak shift from D = 2π(B/Δω) 1/2 , where, B ≈ 2.0 cm -1 ·nm 2 , Δω is the peak shift compared with that of the cubic Ge. The average size of Ge nanoparticles increased from 1.95 to 8.87 nm corresponding to the reduction temperature from 500°C to 700°C.…”
Section: Mullite Composite Powders Containing Photoluminescent Ge Nanmentioning
confidence: 99%