1975
DOI: 10.1103/physrevb.12.1172
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Raman scattering and phonon dispersion in Si and GaP at very high pressure

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Cited by 480 publications
(172 citation statements)
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“…11(b)) observed positions of the Si-Si(Ge) Raman peak is $15 cm À1 , and it can be associated with a considerable laser heating induced thermal stress of the order of 2-3 GPa. 49,50 Stress is known to affect the Raman polarization dependence in Si/SiGe nanostructures, 51 and this notion explains the experimental data shown in Fig. 8.…”
Section: Discussionsupporting
confidence: 67%
“…11(b)) observed positions of the Si-Si(Ge) Raman peak is $15 cm À1 , and it can be associated with a considerable laser heating induced thermal stress of the order of 2-3 GPa. 49,50 Stress is known to affect the Raman polarization dependence in Si/SiGe nanostructures, 51 and this notion explains the experimental data shown in Fig. 8.…”
Section: Discussionsupporting
confidence: 67%
“…Using a bulk value [26] for χ T = 0.01012 GPa −1 , the mode Grüneisen parameter is calculated to be 1.12, which is in agreement with other findings [27,28].…”
supporting
confidence: 77%
“…13,14 Raman scattering, or more generally inelastic light scattering is a standard nondestructive contactless characterization technique of materials, which allows to access mainly the phonon modes at the ⌫ point and in some cases to the dispersion. [15][16][17] Raman spectroscopy can be realized by using a confocal microscope, thereby obtaining lateral submicron resolutions of the properties of a material. It has been developed to be a versatile tool for the characterization of semiconductors leading to detailed information on crystal structure, phonon dispersion, electronic states, composition, strain and so on of semiconductor nanostructures or nanowires.…”
Section: Introductionmentioning
confidence: 99%