In many areas of science and technology, patterned films and surfaces play a key role
in engineering and development of advanced materials. Here, we introduce a new
generic technique for the fabrication of polysaccharide nano-structures via focused
electron beam induced conversion (FEBIC). For the proof of principle, organosoluble
trimethylsilyl-cellulose (TMSC) thin films have been deposited by spin coating on
SiO2 / Si and exposed to a nano-sized electron beam. It turns out
that in the exposed areas an electron induced desilylation reaction takes place
converting soluble TMSC to rather insoluble cellulose. After removal of the
unexposed TMSC areas, structured cellulose patterns remain on the surface with FWHM
line widths down to 70 nm. Systematic FEBIC parameter sweeps reveal a
generally electron dose dependent behavior with three working regimes: incomplete
conversion, ideal doses and over exposure. Direct (FT-IR) and indirect chemical
analyses (enzymatic degradation) confirmed the cellulosic character of ideally
converted areas. These investigations are complemented by a theoretical model which
suggests a two-step reaction process by means of
TMSC → cellulose and
cellulose → non-cellulose
material conversion in excellent agreement with experimental data. The
extracted, individual reaction rates allowed the derivation of design rules for
FEBIC parameters towards highest conversion efficiencies and highest lateral
resolution.