2020
DOI: 10.3390/molecules25071683
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Rapid and Scalable Wire-bar Strategy for Coating of TiO2 Thin-films: Effect of Post-Annealing Temperatures on Structures and Catalytic Dye-Degradation

Abstract: Titanium dioxide (TiO 2 ) thin films were rapidly coated on Corning glass substrates from the precursor solution using the wire-bar technique at the room temperature and then post-annealed at 400, 500 and 600 • C for 1 h under atmospheric conditions. The structural, morphological, optical, wettability and photocatalytic properties of the films were studied. X-ray diffraction analysis confirmed the formation of an anatase TiO 2 structure irrespective of the post-annealing temperatures. The optical transparency … Show more

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Cited by 7 publications
(4 citation statements)
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“…Titanium dioxide (TiO 2 ) is a widely used photocatalyst because of its low cost, environmental friendliness, and stable photocatalytic reaction [ 1 , 2 ]. There are three forms of TiO 2 phases (anatase, rutile, and brookite), in which the anatase phase has higher photocatalytic activity than both the rutile and brookite phases.…”
Section: Introductionmentioning
confidence: 99%
“…Titanium dioxide (TiO 2 ) is a widely used photocatalyst because of its low cost, environmental friendliness, and stable photocatalytic reaction [ 1 , 2 ]. There are three forms of TiO 2 phases (anatase, rutile, and brookite), in which the anatase phase has higher photocatalytic activity than both the rutile and brookite phases.…”
Section: Introductionmentioning
confidence: 99%
“…Full annealing consists of tandem heating and cooling steps. Cooling rate and annealing temperature are usually two critical elements for homogenization of metals, alloys, and semiconductors ( 22 , 23 ). In metallurgy, the annealing temperature is usually 30 °C to 50 °C greater than the upper critical temperature of metals ( 24 ).…”
Section: Resultsmentioning
confidence: 99%
“…Full annealing consists of two tandem heating and cooling steps. Cooling rate and annealing temperature are usually two critical elements for homogenization of metals, alloys, and semiconductors (22, 23). In metallurgy, the annealing temperature is usually 30°C to 50°C greater than the upper critical temperature of metals (24).…”
Section: Resultsmentioning
confidence: 99%