Rapid Growth of Diamond-like Carbon Films by Nanopulse Magnetron Chemical Vapor Deposition

Abstract

In this paper, we describe the development of a rapid deposition method for diamond-like carbon (DLC) films. The deposition rate of DLC films is investigated using magnetic field enhanced nanopulse plasma chemical vapor deposition (CVD). The maximum deposition rate of DLC films produced by this magnetron CVD is approximately fifty times larger than that of the same films produced by conventional plasma CVD. The area of DLC films having a high deposition rate corresponds to the region of the magnetic field distribution where the field is parallel to the substrate at heights of 15 -20 mm.