Rapid Identification of Areas of Interest in Thin Film Materials Libraries by Combining Electrical, Optical, X-ray Diffraction, and Mechanical High-Throughput Measurements: A Case Study for the System Ni–Al

Abstract

The efficient identification of compositional areas of interest in thin film materials systems fabricated by combinatorial deposition methods is essential in combinatorial materials science. We use a combination of compositional screening by EDX together with high-throughput measurements of electrical and optical properties of thin film libraries to determine efficiently the areas of interest in a materials system. Areas of interest are compositions which show distinctive properties. The crystallinity of the thus determined areas is identified by X-ray diffraction. Additionally, by using automated nanoindentation across the materials library, mechanical data of the thin films can be obtained which complements the identification of areas of interest. The feasibility of this approach is demonstrated by using a Ni-Al thin film library as a reference system. The obtained results promise that this approach can be used for the case of ternary and higher order systems.

Unraveling Self‐Doping Effects in Thermoelectric TiNiSn Half‐Heusler Compounds by Combined Theory and High‐Throughput Experiments

“…Pictures of the ML were taken using an in-house built photo setup. [ 42 ] The Seebeck coeffi cients of the materials library were measured using the Potential-Seebeck Microprobe. [ 43 ] This scanning setup consists of a heated probe tip, an X -Y -Z stage and two type-T thermocouples and electronics for data acquisition.…”

Accessing Metastability in Heterostructural Semiconductor Alloys

“…In recent years, high‐throughput combinatorial materials science methodology has gained tremendous interest. Combinatorial deposition followed by spatially resolved, automated characterization offers the promise of rapid and efficient materials screening, optimization, and discovery . Figure B shows the three integral steps of combinatorial high‐throughput phase screening: combinatorial synthesis, spatially resolved properties mapping, and automated data analysis.…”

“…Combinatorial deposition followed by spatially resolved, automated characterization offers the promise of rapid and efficient materials screening, optimization, and discovery. [27][28][29][30][31][32][33][34] Figure 2B shows the three integral steps of combinatorial highthroughput phase screening: combinatorial synthesis, spatially resolved properties mapping, and automated data analysis. Combinatorial non-equilibrium PVD is an invaluable tool for the efficient screening of novel alloy material systems.…”

High‐Throughput Investigation of the Oxidation and Phase Constitution of Thin‐Film Ni–Al–Cr Materials Libraries

“…high-throughput measurement method change their optical appearance: photography [14] color changes are either related to the color of the formed oxide and/or thickness-dependent interference colors in the case of transparent oxides. delaminate from the substrate due to stresses induced by the oxidation of the metal change their electrical resistance, due to the transition from a metallic state to a semiconducting or insulating state resistance screening [15] increase in thickness caused by volume increase due to structure change caused by oxidation microstructured substrate and automated thickness measurements [16] change the film structure automated RBS [17] change their crystallinity; e.g., from a crystalline metal to an amorphous or crystalline oxide automated XRD [14] change their oxygen content automated EDX and RBS [17] nominal thickness of the materials libraries was $600 nm. After deposition, the as-deposited multilayer precursor structure was annealed at 500°C for 1 h in vacuum (pressure <1.3 Â 10 À8 Pa) in order to initiate and promote phase formation.…”