Rapid spatially-resolved post-synthetic patterning of metal–organic framework films

Abstract

Reactive inkjet printing was used for fast and facile spatially-controlled post-synthetic patterning of metal-organic framework films. Here, we report use of the reactive inkjet printing technique to rapidly produce patterned...

Reactive Extrusion Printing for Simultaneous Crystallization‐Deposition of Metal–Organic Framework Films

“…Extrusion printing using pre‐formed MOF particles [10] in gels is known [11] but to the best of our knowledge reactive extrusion printing of MOFs and MOF films represents a new advance. We recently reported reactive inkjet printing for the spatial postsynthetic modification of pre‐formed MOF films [12] . Extrusion differs from inkjet printing in that droplets are forced physically from the nozzle, usually under mechanical force.…”

“…We recently reported reactive inkjet printing for the spatial postsynthetic modifi- cation of pre-formed MOF films. [12] Extrusion differs from inkjet printing in that droplets are forced physically from the nozzle, usually under mechanical force.…”

Postsynthetic Photochemical Modification and 2D Structuring of Zr‐MOF Thin Films Containing Benzophenone Linker Molecules

“…provide one of the few examples, using MOF films with azido‐ and alkyne‐functionalities as photoresist and patterning material [15] . Another recent publication from the Wagner group reports on reactive inkjet printing used for spatially controlled post‐synthetic patterning of UiO‐66‐NH 2 films on FTO glass [16] . Laser beam patterns generated by an interferometer were used to structure HKUST‐1 films: At low intensities, the patterning was reversible, as it relied on dehydration and rehydration of the MOF; at high laser intensities, the patterning was irreversible due to destruction of the MOF in the irradiated regions [17] …”

“…[15] Another recent publication from the Wagner group reports on reactive inkjet printing used for spatially controlled post-synthetic patterning of UiO-66-NH 2 films on FTO glass. [16] Laser beam patterns generated by an interferometer were used to structure HKUST-1 films: At low intensities, the patterning was reversible, as it relied on dehydration and rehydration of the MOF; at high laser intensities, the patterning was irreversible due to destruction of the MOF in the irradiated regions. [17] Here, we introduce a novel, reliable and versatile, photochemical method as a new platform for post-synthetic modification and patterning of thin films of MOFs using light.…”

Postsynthetische Photochemische Modifizierung und 2D Strukturierung von Zr‐MOF Dünnfilmen mit Benzophenon Linkermolekülen

“…liefern mit der Strukturierung von MOF‐Filmen mit Azido‐ und Alkin‐Funktionalitäten eines der wenigen Beispiele auf dem Gebiet [15] . Eine weitere kürzlich erschienene Veröffentlichung der Wagner‐Gruppe berichtet über einen reaktiven Tintenstrahldruck für die räumlich kontrollierte postsynthetische Strukturierung von Zr‐basierten UiO‐66‐NH 2 ‐Schichten auf FTO‐Glas [16] . Mit einem Interferometer erzeugte Laserstrahlmuster wurden zur Strukturierung von HKUST‐1‐Filmen verwendet: Bei niedrigen Intensitäten war die Strukturierung reversibel, da sie auf der Dehydratisierung und Rehydratisierung des MOFs beruhte; bei hohen Laserintensitäten war die Strukturierung aufgrund der Zerstörung des MOFs in den bestrahlten Bereichen irreversibel [20] …”