2016
DOI: 10.1038/srep24890
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Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices

Abstract: We report a one-step polymer-free approach to patterning graphene using a stencil mask and oxygen plasma reactive-ion etching, with a subsequent polymer-free direct transfer for flexible graphene devices. Our stencil mask is fabricated via a subtractive, laser cutting manufacturing technique, followed by lamination of stencil mask onto graphene grown on Cu foil for patterning. Subsequently, micro-sized graphene features of various shapes are patterned via reactive-ion etching. The integrity of our graphene aft… Show more

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Cited by 45 publications
(33 citation statements)
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“…25 But this approach strongly relies on the initial positions of graphene stack edges, and the distribution and geometry of the as-produced GNRs are thus limited to discrete concentric ribbon circles. 25 In parallel, tailoring the geometry of GNRs into elastic forms [26][27][28][29] has been recognized as the key to gain extra stretchability for the rigid graphene, which is rather flexible but not much stretchable. The maximum tolerable strains of graphene sheets, reported in the literature, ranges from 1 to 3%.…”
Section: Introductionmentioning
confidence: 99%
“…25 But this approach strongly relies on the initial positions of graphene stack edges, and the distribution and geometry of the as-produced GNRs are thus limited to discrete concentric ribbon circles. 25 In parallel, tailoring the geometry of GNRs into elastic forms [26][27][28][29] has been recognized as the key to gain extra stretchability for the rigid graphene, which is rather flexible but not much stretchable. The maximum tolerable strains of graphene sheets, reported in the literature, ranges from 1 to 3%.…”
Section: Introductionmentioning
confidence: 99%
“…The resulting graphene patterns, however, have poor feature resolution. Photolithography‐based microfabrication for graphene patterning is relatively complex and requires multiple steps such as film deposition, lithography, and etching. Recently, various interesting methods have been developed for patterning and transferring graphene‐based materials onto different substrates.…”
Section: Introductionmentioning
confidence: 99%
“…Parylene‐C has been also shown to be amenable for fabricating shadow masks, but its fabrication process is complex and requires multiple time‐consuming steps including chemical vapor deposition, thermal evaporation, and reactive ion etching . Flexible membranes made of other polymeric materials such as polyimide (PI), polytetrafluoroethylene, poly(methyl methacrylate) mostly fabricated by laser micromachining have been investigated by many groups . However, severe polymer warping during laser cutting, low control over the feature size, and high cost of the process are critical issues.…”
mentioning
confidence: 99%