2002
DOI: 10.1109/jstqe.2002.801690
|View full text |Cite
|
Sign up to set email alerts
|

Rare-earth-doped GaN: growth, properties, and fabrication of electroluminescent devices

Abstract: A review is presented of the fabrication, operation, and applications of rare-earth-doped GaN electroluminescent devices (ELDs). GaN:RE ELDs emit light due to impact excitation of the rare earth (RE) ions by hot carriers followed by radiative RE relaxation. By appropriately choosing the RE dopant, narrow linewidth emission can be obtained at selected wavelengths from the ultraviolet to the infrared. The deposition of GaN:RE layers is carried out by solid-source molecular beam epitaxy, and a plasma N 2 source. … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

4
174
0

Year Published

2003
2003
2020
2020

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 283 publications
(178 citation statements)
references
References 59 publications
4
174
0
Order By: Relevance
“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14] In particular, the large band gaps of GaN, AlN, and their alloys allow emission of higher energy rare earth transitions that are otherwise absorbed in smaller band gap host materials. Therefore, these materials may have application in visible displays or in white light systems that employ color-combining techniques.…”
mentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9][10][11][12][13][14] In particular, the large band gaps of GaN, AlN, and their alloys allow emission of higher energy rare earth transitions that are otherwise absorbed in smaller band gap host materials. Therefore, these materials may have application in visible displays or in white light systems that employ color-combining techniques.…”
mentioning
confidence: 99%
“…This broad excitation band overlaps higher lying intra-4 f Eu 3ϩ energy levels, providing an efficient pathway for carrier-mediated excitation of Eu 3ϩ ions in The visible and infrared light emissions from rare-earthdoped GaN ͑GaN:RE͒ are of significant current interest for applications in thin-film electroluminescence ͑EL͒ devices. [1][2][3][4] For achieving red light emission, the 5 D 0 → 7 F 2 intra-4 f transition of trivalent Eu 3ϩ ions seems most promising. Intense red photoluminescence ͑PL͒ around 622 nm from GaN:Eu ͑as-grown and ion-implanted͒ has been reported from several research groups.…”
mentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9] In addition, several EL device structures based on GaN:Eu have been demonstrated. [1][2][3][4][5] The optimization of present EL devices, however, requires a more detailed understanding of the incorporation, excitation, and emission properties of Eu 3ϩ ions in the GaN host matrix.Several studies have recently appeared focusing on the preparation and optical properties of GaN:Eu. 4 -11 Based on the comparison to RE ions in other III-V semiconductors ͑e.g., InP:Yb, 12 GaAs:Er 13 ͒, the most probable lattice location for Eu 3ϩ ions in GaN are ͑substitutional͒ Ga sites, which have C 3V symmetry.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…[1][2][3][4] Previous work on visible emission from RE-doped III-Ns was mainly focused on RE-doped GaN. [1][2][3] Photoluminescence ͑PL͒ and cathodoluminescence ͑CL͒ data have been reported from nearly all lanthanide ions doped into GaN.…”
mentioning
confidence: 99%