2016
DOI: 10.1007/s11664-016-5062-8
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Rare Earth Interstitials in Ge: A Hybrid Density Functional Theory Study

Abstract: In this work, the results of density functional theory calculations for rare earth (Ce, Pr, Eu and Er) interstitials in Ge are presented. We employed the hybrid functional of Heyd, Scuseria, and Ernzerhof (HSE06) for all the calculations. We calculated the formation energies and charge state transition levels for the tetrahedral (T) and hexagonal (H) configurations of the Ce, Pr, Eu and Er interstitials in Ge. While for the T configuration, the charge states of the Ce and Pr did not induce any thermodynamic ac… Show more

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Cited by 10 publications
(10 citation statements)
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“…Metastability of charge states in a point defect (vacancy, interstitials, interstitialcomplex, vacancy-complexes) has been reported for Si [49,50], Ge [8,6,51] and…”
Section: Metastability Of B and N Vacancy-complexes In 4h-sicmentioning
confidence: 99%
“…Metastability of charge states in a point defect (vacancy, interstitials, interstitialcomplex, vacancy-complexes) has been reported for Si [49,50], Ge [8,6,51] and…”
Section: Metastability Of B and N Vacancy-complexes In 4h-sicmentioning
confidence: 99%
“…However, the HSE06 functional has been used to predict accurately the electronic band gap and improve charge state transition properties for group−IV semiconductors [2,12,30]. According to our previous reports [10,20], the modelling and prediction of the electronic properties of material with the f orbital valence shell was difficult, because the f orbital is highly localized. Recently, the hybrid functional has been successfully used to predict the electronic and band gap properties of several materials with the f orbital in the valence shell [10,31,32].…”
Section: Computational Detailsmentioning
confidence: 99%
“…The Tm 3+ and Ce 3+ interstitials in Ge are found to exhibit charge state negative-U ordering [20,10].…”
Section: Introductionmentioning
confidence: 99%
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“…RE substitutional, interstitials and vacancy−complex related defects in Si and Ge have been studied with emphasis on the induced defect levels [6,7,8,9,10]. Ge has a narrow band gap of 0.78 eV at 0 K, and is being considered as a suitable material for next generation high performance microelectronics devices [11,12,13]: such as mobility−enhanced metal−oxide−semiconductor field−effect transistors (MOSFETs). In addition, Ge provides an alternative solution for the search of materials that required high mobility channels.…”
Section: Introductionmentioning
confidence: 99%