Reaching the Theoretical Resonance Quality Factor Limit in Coaxial Plasmonic Nanoresonators Fabricated by Helium Ion Lithography

Melli, Mauro; Polyakov, A. Y.; Gargas, Daniel J.; Huynh, Chuong; Scipioni, Larry; Bao, Wei; Ogletree, D. Frank; Schuck, P. James; Cabrini, Stefano; Weber‐Bargioni, Alexander

doi:10.1021/nl400844a

Cited by 111 publications

(108 citation statements)

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“…He þ exposure alone produces the typical subsurface damage which extends several hundreds of nanometers. This region is characterized by high defect density as well as amorphization of 40 using Ga þ and He þ , respectively. Milling doses were selected to achieve optimal resolution with each ion species.…”

Section: -4 Stanford Et Almentioning

confidence: 99%

Review Article: Advanced nanoscale patterning and material synthesis with gas field helium and neon ion beams

Stanford

Lewis

Mahady

et al. 2017

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Focused ion beam nanoscale synthesis has emerged as a critical tool for selected area nanofabrication. Helium and neon ion beams from the gas field ion source have recently demonstrated unparalleled resolution among other scanning ion beams. In this review, the authors focus on the nanoscale synthesis applications for these ion species which have been demonstrated to date. The applications and recent work can broadly be grouped into the following categories: (1) Monte Carlo simulations, (2) direct-write milling or sputtering, (3) ion beam lithography, (4) selective ion implantation or defect introduction, and (5) gas-assisted processing. A special emphasis is given toward using He þ and Ne þ for the processing of two dimensional materials, as several groups have demonstrated promising results. Finally, the authors will discuss the future outlook of He þ and Ne þ nanoprocessing techniques and applications.

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Section: -4 Stanford Et Almentioning

confidence: 99%

Review Article: Advanced nanoscale patterning and material synthesis with gas field helium and neon ion beams

Stanford

Lewis

Mahady

et al. 2017

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…23 Focused ion beam (FIB) milling is a technique often used to achieve narrow-gap plasmonic aperture devices. For example, Ga þ -FIB has been used to fabricate coaxial 24 and bowtie 25 apertures with gap sizes down to 30 nm. However, realizing smaller gaps can be challenging due to the finite ion beam size and ion-substrate interaction.…”

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confidence: 99%

“…However, realizing smaller gaps can be challenging due to the finite ion beam size and ion-substrate interaction. 24 Recently, researchers have used milling-based He þ -ion lithography (HIL) to produce apertures with even smaller gap sizes, down to 8 nm in coaxial shapes 24 and 5 nm in dimers. [26][27][28] HIL provides better spatial resolution and lateral smoothness than Ga þ based FIB.…”

mentioning

confidence: 99%

“…[26][27][28] HIL provides better spatial resolution and lateral smoothness than Ga þ based FIB. 24 However, both of these techniques are serial in nature, and fabrication of large arrays of devices is challenging. Electron beam lithography (EBL), followed by lift-off or ion milling, is a more scalable approach, capable of producing high resolution features at much a higher production rate.…”

mentioning

confidence: 99%

“…This is better than what has previously been achieved with coaxial metal aperture using Ga þ -ion based FIB (30 nm gap, aspect ratio 3:1) and is comparable to the results obtained with the He þ based FIB (8 nm gap, aspect ratio 13:1). 24 Importantly, our approach is scalable and allows for realization of many devices in parallel. For example, we show that by varying the geometry of the bowties, resonances can be designed to span wide wavelength range, from 470 to 687 nm on one sample.…”

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confidence: 99%

See 2 more Smart Citations

10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process

Huang

Holzgrafe

Jensen

et al. 2016

Applied Physics Letters

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Synthesis, Assembly, Optical Properties, and Sensing Applications of Plasmonic Gap Nanostructures

Kim

Lee

et al. 2021

Advanced Materials

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sharp-tip structures with a highly focused field at the end of the tip. [7] In particular, plasmonic gap nanostructures (PGNs) are among the most promising materials for diverse applications with highly localized field and amplified optical signals in the gap including sensing, spectroscopy, optics, biomedicine, electronics, and energy applications. [8][9][10][11][12][13] The development of bottom-up or top-down synthetic methods enabled the access to numerous nanogap structures with diverse gap sizes, morphologies, and compositions. [14][15][16][17][18] The highly localized electric field inside the plasmonic nanogap and the appearance of plasmonic coupling in closely neighboring structures have been studied, leading to the discovery of interesting optical phenomena and advances in sensing such as ultrasensitive spectroscopy, singlemolecule sensing methods, and in situ detection techniques. [19][20][21] As small changes in the distance, morphology, and composition of the nanogap lead to significant variations in the optical responses, the highly precise, controllable, and high-yielding preparation of PGNs is important to achieve reproducible and reliable results. However, although numerous pioneering studies on basic synthetic methods, characteristics, and applications enabled the understanding and control over plasmonic nanogaps, key challenges still remain for the practical use and applications of PGNs. In particular, the sub-nanometer, atomic-level control of the nanogap, coupled with the scaling-up issue, and its fundamental understanding have not yet been fully accomplished. For example, in surfaceenhanced Raman spectroscopy (SERS) using plasmonic gaps, early research focused on a high enhancement factor (EF). In contrast, recent studies revealed that a deep understanding at atomic scale is required, as differences in the small regime such as picocavities or molecular orientation can have a large effect on the signal. [22][23][24] Hence, a comprehensive understanding of the nanogap is critical to the further development of the field.This progress report addresses emerging issues and challenges in the field of nanogap-based plasmonics and plasmonic nanomaterials. We first describe the challenges in the creation of intra-or intergaps by bottom-up or top-down synthesis, and discuss breakthroughs that allow for overcoming these obstacles. Next, optical properties according to gap size, morphology, and composition are summarized to provide insight into the nature of gap plasmonics. The discussion of applications in this article mainly highlights surface-enhanced Plasmonic gap nanostructures (PGNs) have been extensively investigated mainly because of their strongly enhanced optical responses, which stem from the high intensity of the localized field in the nanogap. The recently developed methods for the preparation of versatile nanogap structures open new avenues for the exploration of unprecedented optical properties and development of sensing applications relying on the amplification of various optical signals....

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Reaching the Theoretical Resonance Quality Factor Limit in Coaxial Plasmonic Nanoresonators Fabricated by Helium Ion Lithography

Cited by 111 publications

References 50 publications

Review Article: Advanced nanoscale patterning and material synthesis with gas field helium and neon ion beams

Review Article: Advanced nanoscale patterning and material synthesis with gas field helium and neon ion beams

10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process

Synthesis, Assembly, Optical Properties, and Sensing Applications of Plasmonic Gap Nanostructures

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