The metalorganic vapor-phase epitaxy (MOVPE) of cadmium zinc
telluride
(Cd1
-
y
Zn
y
Te)
from dimethylcadmium (DMCd), dimethylzinc (DMZn), diethylzinc (DEZn), and
diisopropyltelluride (DIPTe) was studied
using on-line infrared spectroscopy to monitor the feed and effluent
gases. The film composition was measured
by X-ray diffraction. No zinc was incorporated into the film when
DMCd and DMZn were used due to the
very low reactivity of the latter compound. When DMCd and DEZn are
tried, the films were nonuniform
with Cd-rich films deposited at the reactor inlet and Zn-rich films
deposited near the reactor outlet. This
film profile was due to alkyl ligand exchange reactions between the
group II precursors in the feed, producing
DMZn, methylethylzinc (MEZn), methylethylcadmium (MECd), and
diethylcadmium (DECd). The
decomposition rates of these precursors vary over a wide range with
DECd reacting at a 250 K lower
temperature than DMZn. Since the organocadmium compounds were
consumed at a much faster rate, CdTe
was deposited first, while ZnTe was deposited downstream. The
ligand exchange reactions explain why
previous workers found it difficult to grow
Cd1
-
y
Zn
y
Te
alloys of uniform composition by MOVPE.