The
kinetics of thiophene and alkane adsorption
on silicatene (i.e., on two-dimensional atomically thin and crystalline
silica films) was studied by employing (multimass) thermal desorption
spectroscopy (TDS) at ultrahigh vacuum. The monoatomic SiO2 film is grown on a Mo(112) support. Thiophene is a standard probe
molecule for hydrodesulfurization (HDS); alkanes typically form as
reaction products; Mo is a catalyst for HDS. The samples were characterized
by Auger electron spectroscopy and low-energy electron diffraction
as well as the silica film additionally by water TDS. The silicatene
film is hydrophobic. All probe molecules adsorbed nondissociatively on silicatene. Two TDS peaks in the monolayer range
are evident as well as a condensation structure. Thiophene binds with
42.6 ± 0.5 kJ/mol in the limit of zero coverage. Using a Redhead
analysis and assumed pre-exponential of 1 × 1013/s,
the (low coverage) binding energy of the alkanes (isobutane, n-pentane, and n-heptane) increases from
34.1 to 46.8 (±0.5) kJ/mol with the chain length. A more sophisticated
data analysis (direct inversion of the Polanyi–Wigner equation)
reveals a chain-length-dependent pre-exponential and binding energy.
In addition, the adsorption dynamics of butane was characterized by
molecular beam scattering. The adsorption probabilities and binding
energies are systematically smaller for silicatene than for polycrystalline
bulk silica wafer.