1987
DOI: 10.1016/0040-6090(87)90171-4
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Reactive arc vapor ion deposition of TiN, ZrN and HfN

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Cited by 64 publications
(5 citation statements)
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“…The ZrN films were deposited on polished flat M2 steel substrates by changing the nitrogen pressure and substrate bias voltage using an arc vapor ion deposition process. 154 Dense columnar coatings with their main axis perpendicular to the interface were produced. The coatings became featureless under low pressure and low voltage deposition conditions.…”
Section: Effect Of the Deposition Flow Ratementioning
confidence: 99%
“…The ZrN films were deposited on polished flat M2 steel substrates by changing the nitrogen pressure and substrate bias voltage using an arc vapor ion deposition process. 154 Dense columnar coatings with their main axis perpendicular to the interface were produced. The coatings became featureless under low pressure and low voltage deposition conditions.…”
Section: Effect Of the Deposition Flow Ratementioning
confidence: 99%
“…With the perfection of TiN, a natural extension of the technology was to investigate, test, and produce a range of other compounds, and in particular other binary nitrides such as CrN, ZrN, and HfN [6,7]. CrN was found to exhibit a lower coefficient of friction than TiN [6].…”
Section: Tin and Other Binary Nitridesmentioning
confidence: 98%
“…15 The ZrN films were deposited on M2 steel using an arc vapor ion deposition process. 117 Scratch test results show that adhesion and film strength varied inversely with microhardness. The load required for lower critical failure increased as the bias voltage was increased.…”
Section: Crystallinity Roughness and Adhesionmentioning
confidence: 99%