Reactive Bilayers by Self-activated Electroless Nickel-Phosphorous Deposition on Pure Aluminum

Narayanan, M. D.; Harsha, Allakonda; Chakraborty, Anirban; Swaminathan, Parasuraman

doi:10.1007/s11837-020-04520-x

Cited by 4 publications

(5 citation statements)

References 43 publications

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“…EN deposition proceeds in an island growth mode, with individual nuclei growing in size and coalescing to form a thin film . A minimum deposition time is required to obtain a continuous stable film, and increasing the deposition time increases the film thickness.…”

Section: Resultsmentioning

confidence: 99%

“…The obtained films have a granular morphology, as shown in Figures a and S1a. Also, the as-deposited films are amorphous in nature, which is normally attributed to the co-deposition of phosphorous. , To convert the amorphous film to crystalline, annealing is carried out, and previous studies indicate that films crystallize above 300 °C but tend to oxidize at temperatures above 400 °C . Hence, an annealing temperature of 350 °C was used in this work to form crystalline nickel.…”

Section: Resultsmentioning

confidence: 99%

“…EN deposition proceeds in an island growth mode, with individual nuclei growing in size and coalescing to form a thin film. 20 A minimum deposition time is required to obtain a continuous stable film, and increasing the deposition time increases the film thickness. In this work, the deposition time was fixed at 30 s, since below that, discontinuous films were obtained and the color change during cycling exhibited a patchy behavior.…”

Section: Resultsmentioning

confidence: 99%

“…This was followed by Au–Pd alloy sputter deposition using a Polaron Series SC7640 high-resolution sputter coater (Quorum Technologies) operating at 1 kV DC output and 25 mA process current for 60 s. This served as the activation layer for EN deposition . The bath composition used was the same for all substrates , and is listed in Table S1. The bath temperature was fixed at 60 °C and controlled using an IKA C-MAG HS-7 digital hot plate and an attached thermocouple.…”

Section: Methodsmentioning

confidence: 99%

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Electrochromic Displays via the Room-Temperature Electrochemical Oxidation of Nickel

2022

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Electrochromism refers to the persistent and reversible change in color by applying an electric field. The phenomenon involves the insertion and extraction of electrons and ions within the active material. There is a keen interest in electrochromic (EC) materials, since they exhibit a wide range of potential applications. In recent years, transition-metal oxides have been widely investigated as EC materials due to their low power requirement, high coloration efficiency, and memory effect under an open-circuit condition. Nickel oxide (NiO), a p-type wide band gap semiconductor, exhibits attractive features such as a high color contrast ratio, good chemical stability, cost-effectiveness, and good compatibility with the cathodically coloring tungsten oxide. NiO thin films have been fabricated by various methods, but these are not cost-effective, scalable, or suitable for flexible applications. With the increasing demand for flexible and soft EC devices, it is essential to find routes to fabricate NiO thin films at lower temperatures. In this work, a NiO/Ni(OH) 2 -based thin EC layer on fluorine-doped tin oxide-coated glass is developed via an electroless nickel (EN) deposition route, followed by room-temperature electrochemical oxidation. The deposition time is optimized to control the film thickness. The EC performance is investigated in an aqueous alkaline electrolyte (1 M KOH) by means of cyclic voltammetry, chronoamperometry, and transmittance measurements. Both the as-deposited and annealed films, after electrochemical oxidation, exhibit excellent EC properties with an optical modulation of approximately 64% (at 550 nm) and good response times of approximately 3 s (coloration) and 14 s (bleaching). A 2 × 2 display obtained by patterning the EN deposition is also demonstrated as part of this work.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

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Electrochromic Displays via the Room-Temperature Electrochemical Oxidation of Nickel

2022

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“…Few studies have focused on the quantitative calculation of the relationship between the deposition rate and deposition surface evolution. Chakraborty et al 33,34 investigated the deposition dynamics on different substrates, and the kinetics of the process were surface-limited. No links and no deposition dynamic model have been established between the microscopic growth process and deposition efficiency.…”

Section: Introductionmentioning

confidence: 99%

YSZ/Ni double‐shell powder via surface electroless deposition tuned by an active kinetic model

Kang

Liu

Chen

et al. 2023

Int J Applied Ceramic Tech

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Yttria‐stabilized zirconia (YSZ) powder with surface Ni plating has promising application in many fields due to its large surface area, low density and excellent high temperature performance. In this study, YSZ/Ni double‐shell powder was fabricated via electroless deposition method, and an active surface kinetic model was developed to tune the surface area and nuclei loading quantitatively. A novel concept, active surface ratio (ASR, the ratio of active deposition surface area to projected area of ceramic powder), is proposed to intrinsically correlate deposition rate with nuclei topology on ceramic surface. The intrinsic relationship between microstructure of metallized ceramic surface and deposition duration was clarified. The active surface kinetic model reveals the correlation between the ASR and instantaneous deposition rate and provides necessary theoretical basis for effective control of ceramic surface modification process by electroless deposition.

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Galvanic replacement deposited copper layer as an efficient activator to realize electroless Ni-P plating on aluminum

Zhao,

Liao,

et al. 2024

J Solid State Electrochem

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Reactive Bilayers by Self-activated Electroless Nickel-Phosphorous Deposition on Pure Aluminum

Cited by 4 publications

References 43 publications

Electrochromic Displays via the Room-Temperature Electrochemical Oxidation of Nickel

Electrochromic Displays via the Room-Temperature Electrochemical Oxidation of Nickel

YSZ/Ni double‐shell powder via surface electroless deposition tuned by an active kinetic model

Galvanic replacement deposited copper layer as an efficient activator to realize electroless Ni-P plating on aluminum

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