Reactive ion beam etching of highly dispersive, high-efficiency transmission gratings for the VIS range

Abstract

Reflection losses due to refractive index mismatch limit the obtainable diffraction efficiencies for transmission gratings in the highly dispersive regime, i.e., with period to wavelength ratios smaller than 0.7. The design and fabrication of such gratings with high-diffraction efficiencies (≥94%, Littrow configuration) will be discussed with an emphasis on process strategies to control the profiles in the reactive ion beam etching step. Experimental results from the manufacturing of monolithic fused silica pulse compression gratings with 3000 L∕mm optimized for a center wavelength of 519 nm will be presented. The influence of different etching parameters such as etch gas mixture, ion incidence angle, and acceleration voltage of the ion source on profile depth, side-wall angle, duty cycle, and ultimately diffraction efficiencies will be discussed.