Reactive ion etching of diamond

Sandhu, Gurtej; Chu, Wenxiang

doi:10.1063/1.101890

Cited by 99 publications

(28 citation statements)

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“…4 However, those as-formed diamond cones were not sharp enough and showed poor electrical conducting properties, which is disadvantageous for use as individual electron point sources. Zhang et al reported the FEE properties of diamond cone arrays formed by bias-assisted reactive etching process.…”

Section: Z Cuimentioning

confidence: 99%

Field electron emission from individual diamond cone formed by plasma etching

Wang

et al. 2006

Applied Physics Letters

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Section: Z Cuimentioning

confidence: 99%

Field electron emission from individual diamond cone formed by plasma etching

Wang

et al. 2006

Applied Physics Letters

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“…Generally, the reactive ion etching of the substrates using patterned masks is one of the most promising techniques for the fabrication of nanocones. However, it can only be applied successfully to certain limited substrates [3][4].In this work, we report a significant subtractive formation process of large-area diamond conical nanostructure arrays on freestanding diamond films using a hot filament chemical vapor deposition (HFCVD) system with negative biasing of the substrates. The etching gas comprising of H2 and CH4 with typical flow rate ratios of 100 : (1.5-4) sccm was employed to generate the plasma at a chamber pressure of about 20-30 Torr.…”

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confidence: 98%

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confidence: 99%

Electron Emission Properties of Diamond Nanocones on Freestanding Diamond Films

Wang

et al. 2006

2006 19th International Vacuum Nanoelectronics Conference

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Nanoscaled cones have been demonstrating their unique usefulness in diverse applications such as high-efficiency field emission, near-field optical microscopy, high-resolution atomic force microscopy, solar cells, optoelectronics and bio/chemical sensing devices [1][2]. Generally, the reactive ion etching of the substrates using patterned masks is one of the most promising techniques for the fabrication of nanocones. However, it can only be applied successfully to certain limited substrates [3][4].In this work, we report a significant subtractive formation process of large-area diamond conical nanostructure arrays on freestanding diamond films using a hot filament chemical vapor deposition (HFCVD) system with negative biasing of the substrates. The etching gas comprising of H2 and CH4 with typical flow rate ratios of 100 : (1.5-4) sccm was employed to generate the plasma at a chamber pressure of about 20-30 Torr. The temperatures of the Ta filament and substrate were set at 2000-2200 'C and 800-900°C, respectively, and the etching duration was 1-3 h. The etching effect of energetic ions on the formation of diamond cone arrays with controlled morphology has been studied in detail. The SEM image shown in Fig. 1 presented that the as-formed nanocones were of uniform cone angle of about 27°and a height of about 3 jtm; the cone density is about 5x107 cm-2. The TEM image of an individual cone indicated that an apex radius of about 1 nm is obtained as shown in Fig.2. The results also show that methylic ions dominantly contribute to diamond cone formation based on a neutral-ion charge exchange collision model. The self-organized selective sputtering process of as-formed hillock bottoms on roughened surface by low energetic ions plays key role for the formation and development of diamond cones [5].The field emission properties of diamond nanocone arrays were measured, which presented lower threshold voltage (6.5V/ it m) and higher emission current density (56014 A/cm2 at 12.5V/ 14 m) compared with those of planar diamond films (threshold voltage:10.8V/ ti m; current density: 60 V A/cm2 at 12.5V/ 14 m). Furthermore, field electron emission properties of an individual diamond cone are investigated using a home-made Double Probe Scanning Electron Microscopy (DPSEM) system. The as-formed sharp diamond cone exhibits high emission current of about 80 14 A at applied voltage of 100 V. The study has opened the possibility of using diamond cone arrays and individual diamond cone as display device and point electron source with excellent electron emission ability.

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“…The first studies on the etching of diamond were performed on high pressure-high temperature (HP/HT) single-crystal samples using an O 2 /H 2 RF plasma. 84 Starting in 1990, several studies have addressed the use of a suitable gas or of gas mixtures to realize plasma treatments of single-crystal or polycrystalline diamond flat plates, 34,85 obtaining nanowire arrays with or without applying a mask. These findings have opened the way for the design and fabrication of pointed diamond nanostructures also for emitting purposes.…”

Section: D Structuresmentioning

confidence: 99%

Nanodiamonds for field emission: state of the art

Terranova

Orlanducci

Rossi³

et al. 2015

Nanoscale

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The aim of this review is to highlight the recent advances and the main remaining challenges related to the issue of electron field emission (FE) from nanodiamonds. The roadmap for FE vacuum microelectronic devices envisages that nanodiamonds could become very important in a short time. The intrinsic properties of the nanodiamond materials indeed meet many of the requirements of cutting-edge technologies and further benefits can be obtained by tailored improvements of processing methodologies. The current strategies used to modulate the morphological and structural features of diamond to produce highly performing emitting systems are reported and discussed. The focus is on the current understanding of the FE process from nanodiamond-based materials and on the major concepts used to improve their performance. A short survey of non-conventional microsized cold cathodes based on nanodiamonds is also reported. IntroductionMiniaturized electron sources based on the field emission (FE) process, namely "cold-cathodes", are nowadays replacing the conventional thermoionic electron sources. FE-based devices are able to operate at high frequency and at high current densities, have no need of heating and are characterized by reduced weight and by instantaneous switching on. Moreover, Maria Letizia TerranovaProfessor of Chemistry at Tor Vergata University of Rome (Italy), Maria Letizia Terranova heads the Minima lab at the Department of Chemical Science and Technology. She has expertise on different scientific topics, including nuclear chemistry, laser-induced reactions in the gas-phase, ion-and laserinduced modifications in solids, electrochemical and vapour deposition processes. Her research activity is mainly focused on the synthesis, processing and functional testing of nanomaterials: carbon nanostructures (nanodiamonds, nanotubes, graphenes, onions), nanocomposites and hybrid organic/ inorganic structures. Materials and systems are produced for applications in micro/nano-electronics, optoelectronics, energetics, sensing, thermal management and bio-related nanotechnologies. She has co-authored 290 papers, 4 patents, and co-edited 4 books. Silvia OrlanducciIn 2004 Fowler-Nordheim and the experiments by Spindt and coworkers 3 paved the way for a number of subsequent researches on FE-based vacuum electronics. The good performance of such devices is based on the fact that, according to the Fowler-Nordheim law, the emitted current density J depends strongly on the local applied electric field E and that geometric factors typical of nanostructures (sharp edges, tips, peaks, nanoprotrusions) locally increase the concentration of electric field at the emitter sites. The ratio of the local field to the applied field, the so-called electric field enhancement factor β, 1 independently of the material, is a key factor influencing the field emission characteristics. In the last two decades the design, realization and application of a new generation of cold cathodes based on advanced nanomaterials have been the object of tremendous i...

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Reactive ion etching of diamond

Cited by 99 publications

References 4 publications

Field electron emission from individual diamond cone formed by plasma etching

Field electron emission from individual diamond cone formed by plasma etching

Electron Emission Properties of Diamond Nanocones on Freestanding Diamond Films

Nanodiamonds for field emission: state of the art

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