Reactive sputtering DC magnetron-deposited TiO<inf>2</inf> thin films intended for photoelectrolysis of water for hydrogen production

Abstract

Because of its photoelectrochemical properties, titanium dioxide is an attractive material in photoelectrolysis of water for hydrogen production. Magnetron sputtering is a common and practicable technique that has been used to deposit TiO 2 thin films with homogeneous uniformity and reproducibility for various applications. This work deals with the growth of anatse titanium dioxide on indium tin oxide substrate using reactive sputtering DC magnetron method to use them in hydrogen production. In view of the influence of processing techniques on the TiO 2 photoelectrochemical properties, the choice of the appropriate technique and the optimization of deposition parameters and thermal traitments must be suitable for efficient water splitting reactions into hydrogen and oxygen. Under the conditions of deposition, anatase TiO 2 thin films were prepared and the effect of annealing temperature on their structural and optical properties was examined. The X-ray analyzes and Raman spectroscopy show that the TiO 2 films with a thickness of 500 nm obtained after annealing at 350 and 450 °C for 60 min of time deposition in an ambient air are anatase phase. The crystallite size of the films is increased with increasing annealing temperature. The deposited TiO 2 thin films have high transparency in the visible range and opaque in the UV region. The optical properties of the films are found to be closely related to the microstructure and crystallographic structure, which depend on the annealing temperature.

Effects of titanium oxide surface properties on bone‐forming and soft tissue‐forming cells

“…35 The literature has shown that deposition of thin titanium films on glass of approximately 140 nm thick with similar annealing temperatures has resulted in an anatase surface phase consistent with this study. [36][37][38] However, most deposition studies rarely deposit films as thin as those used in this study. The conversion of amorphous titanium oxide to crystalline anatase could be attributed to several properties of the sputtering process, such as chamber pressure or temperature, which alter the properties of the oxide.…”