2006
DOI: 10.1016/j.jallcom.2005.04.208
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Reactivities of H2, O2 and H2O with the Cr surface between 77K and 298K

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Cited by 3 publications
(5 citation statements)
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“…5). Although it is still ambiguous, the existence of Cr on the surface of catalyst seemed able to affect the kinetics of the H 2 reaction (Kato et al, 2006). This finding also mentioned that Cr could adsorb more hydrogen atoms than Co and Ni and possibly perform H 2 formation on the surface of the catalyst.…”
Section: Plasma With Oxide Of Zn and Cr Catalystmentioning
confidence: 92%
“…5). Although it is still ambiguous, the existence of Cr on the surface of catalyst seemed able to affect the kinetics of the H 2 reaction (Kato et al, 2006). This finding also mentioned that Cr could adsorb more hydrogen atoms than Co and Ni and possibly perform H 2 formation on the surface of the catalyst.…”
Section: Plasma With Oxide Of Zn and Cr Catalystmentioning
confidence: 92%
“…Owing to the endothermic reaction for the Cr-H system, the reaction process is expected to take place only in the surface region. Further details of the reaction kinetics of a gas (H 2 , O 2 , H 2 O) with the clean surface of Cr were reported in the previous paper [2]. In the present study, in order to examine the poisoning effects of O 2 and H 2 O preadsorptions on the H 2 reactivity, the clean surface of Cr was intentionally contaminated by exposing to O 2 or H 2 O gases with the amounts of 5 and 14 ML for each gas before H 2 exposure (shown in Fig.…”
Section: Methodsmentioning
confidence: 99%
“…Fig. 1 shows the reactivity of a gas (H 2 , O 2 , H 2 O) with the clean surface of Cr as a function of the amount of gas molecules reacted N gas at 298 K, and also, the reactivity of H atoms dissociated from H 2 O molecules is shown, which was calculated from the partial pressure of H 2 molecules desorbed in H 2 O adsorption [2]. At the initial stage, the reactivities of H 2 , O 2 and H 2 O with the clean surface of Cr were measured as the highest reaction probability r gas = 1.…”
Section: Methodsmentioning
confidence: 99%
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