2007
DOI: 10.1016/j.jnoncrysol.2006.10.038
|View full text |Cite
|
Sign up to set email alerts
|

Reactivity of SiCl and SiF groups in SiO2 glass with mobile interstitial O2 and H2O molecules

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
5
0

Year Published

2010
2010
2024
2024

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 10 publications
(6 citation statements)
references
References 21 publications
1
5
0
Order By: Relevance
“…Surface Si−Cl oxidation to SiO x by O 2 (g) and/or small amounts of H 2 O is spontaneous due to their large negative change in the Gibbs free energy, in analogy to SiCl 4 oxidation. 42 An average BUSiNP particle size of 1.7 ± 0.8 nm was estimated by TEM (see Supporting Information TEM), in agreement with reported sizes (1.6−1.8 nm) for SiNPs synthesized by similar chemical wet methods involving inverse micelles. 11,13 SAXS experiments with toluene suspensions of BUSiNP indicate the presence of a distribution of particles with different sizes/shapes as indicated by the upward curvature of the Guinier plot obtained from the scattering curves (see Figure 2a).…”
Section: ■ Materials and Methodssupporting
confidence: 85%
See 1 more Smart Citation
“…Surface Si−Cl oxidation to SiO x by O 2 (g) and/or small amounts of H 2 O is spontaneous due to their large negative change in the Gibbs free energy, in analogy to SiCl 4 oxidation. 42 An average BUSiNP particle size of 1.7 ± 0.8 nm was estimated by TEM (see Supporting Information TEM), in agreement with reported sizes (1.6−1.8 nm) for SiNPs synthesized by similar chemical wet methods involving inverse micelles. 11,13 SAXS experiments with toluene suspensions of BUSiNP indicate the presence of a distribution of particles with different sizes/shapes as indicated by the upward curvature of the Guinier plot obtained from the scattering curves (see Figure 2a).…”
Section: ■ Materials and Methodssupporting
confidence: 85%
“…Both IR and XPS data agree in indicating that the surface of freshly prepared particles is chlorinated and is partially oxidized to SiO x upon aging. Surface Si–Cl oxidation to SiO x by O 2 (g) and/or small amounts of H 2 O is spontaneous due to their large negative change in the Gibbs free energy, in analogy to SiCl 4 oxidation …”
Section: Resultsmentioning
confidence: 99%
“…F, as a deteriorating anion for Si is the most important element for the main ingredient of bioceramics of interest for this study. Therefore, to some extend, SiF 4 may be formation which is perhaps responsible for the corrosion of the bioceramic 1213. Organic acids such as citric acid (as in lemon, apple and peppermint) and benzydamine hydrochloride as in many vitamin and drugs can easily deform the surface of ceramic composites, which then results in color change.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, to some extend, SiF 4 may be formation which is perhaps responsible for the corrosion of the bioceramic. 12 13 Organic acids such as citric acid (as in lemon, apple and peppermint) and benzydamine hydrochloride as in many vitamin and drugs can easily deform the surface of ceramic composites, which then results in color change. Mouthrinse solutions as well as soft drinks, including tea and coffee, often give their colour to restorative materials due to the organic dye content which either enter into the nano pores of ceramics and polymers or absorbs onto the surface.…”
Section: Introductionmentioning
confidence: 99%
“…SiCl 4 can rapidly hydrolyze to form silica sol when it meets water, and then the silica sol rapidly forms an opaque gel, 28,29 and the corresponding reaction equation is presented in Equation (). In addition, SiCl 4 can rapidly hydrolyze to produce silicic acid gel as contact with water, 30,31 and the reaction equation is displayed in Equation (). 4Clbadbreak+SiO2goodbreak+4H+SiCl4goodbreak+2H2O$$\begin{equation}4C{l^ - } + Si{O_2} + 4{{\mathrm{H}}^ + } \to SiC{l_4} + 2{H_2}O\end{equation}$$ SiCl4badbreak+2H2OSiO2goodbreak+4HCl$$\begin{equation}SiC{l_4} + 2{H_2}O \to Si{O_2} + 4HCl\end{equation}$$ SiCl4badbreak+4H2OH4SiO4goodbreak+4HCl$$\begin{equation}SiC{l_4} + 4{H_2}O \to {H_4}Si{O_4} + 4HCl\end{equation}$$…”
Section: Surface Corrosion Mechanismmentioning
confidence: 99%