Real space soft x-ray imaging at 10 nm spatial resolution

Chao, Weilun; Fischer, Peter; Tyliszczak, Tolek; Rekawa, Senajith; Anderson, Erik H.; Naulleau, Patrick

doi:10.1364/oe.20.009777

Cited by 241 publications

(139 citation statements)

References 21 publications

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“…When compared with the conventional FZP manufacturing technique, namely the EBL, ML-FZPs present a number of interesting characteristics. Advantages of EBL-FZPs include currently the highest spatial resolutions among point focusing optics [41,61,62] and easy access to larger diameters in general. They are also conveniently fabricated, via well developed schemes, on flat membranes which makes them easier to align.…”

Section: Discussionmentioning

confidence: 99%

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

Keskinbora¹,

Robisch²,

Mayer³

et al. 2014

Opt. Express

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X-ray microscopy is a successful technique with applications in several key fields. Fresnel zone plates (FZPs) have been the optical elements driving its success, especially in the soft X-ray range. However, focusing of hard X-rays via FZPs remains a challenge. It is demonstrated here, that two multilayer type FZPs, delivered from the same multilayer deposit, focus both hard and soft X-rays with high fidelity. The results prove that these lenses can achieve at least 21 nm half-pitch resolution at 1.2 keV demonstrated by direct imaging, and sub-30 nm FWHM (fullpitch) resolution at 7.9 keV, deduced from autocorrelation analysis. Reported FZPs had more than 10% diffraction efficiency near 1.5 keV. ©2014 Optical Society of AmericaOCIS codes: (340.7460) X-ray microscopy; (340.0340) X-ray optics; (340.6720) Synchrotron radiation; (340.7480) X-rays, soft x-rays, extreme ultraviolet (EUV); (050.1965) Diffractive lenses; (220.4241) Nanostructure fabrication. References and links1. J. Vila-Comamala, Y. Pan, J. J. Lombardo, W. M. Harris, W. K. S. Chiu, C. David, and Y. Wang, "Zonedoubled Fresnel zone plates for high-resolution hard X-ray full-field transmission microscopy," J. Synchrotron Radiat. 19(5), 705-709 (2012). 2. E. Zschech, C. Wyon, C. E. Murray, and G. Schneider, "Devices, materials, and processes for nanoelectronics: characterization with advanced x-ray techniques using lab-based and synchrotron radiation sources," Adv. Eng. Mater. 13(8), 811-836 (2011 Schütz, "Fast spin-wave-mediated magnetic vortex core reversal," Phys. Rev. B 86(13), 134426 (2012). 5. J. Kirz and C. Jacobsen, "The history and future of X-ray microscopy," J. Phys. Conf. Ser. 186, 012001 (2009). 6. P. Kirkpatrick and A. V. Baez, "Formation of optical images by X-Rays," J. Opt. Soc. Am. 38(9), 766-774 (1948 International Journal of Optics 31(4), 403-413 (1984). 46. A. A. Michelson, Studies in Optics (Dover Publications, Incorporated, 1995. 47. G. R. Morrison, "Phase contrast and darkfield imaging in x-ray microscopy," Proc. SPIE 1741, 186-193 (1993).

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Section: Discussionmentioning

confidence: 99%

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

Keskinbora¹,

Robisch²,

Mayer³

et al. 2014

Opt. Express

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“…X‐ray microscopy emerged as a very strong tool for natural sciences by providing half‐pitch spatial resolutions of about 10 nm1, 2, 3, 4 and high penetration depths combined with structural, chemical, and magnetic contrast 5, 6, 7. The importance of X‐ray microscopy will grow in the near future owing to exciting developments such as the emergence of next generation synchrotron sources,8, 9, 10 new X‐ray free electron lasers (XFEL), high brilliance laboratory X‐ray sources and high harmonic generation sources providing radiation in the extreme ultraviolet (EUV) regime 11.…”

Section: Introductionmentioning

confidence: 99%

“…In the EUV and soft X‐ray regime, where wavelengths are relatively large and X‐ray matter interactions are dominated by high absorption, lithographically fabricated FZPs14, 15, 16, 17, 18 have become the standard optics with full‐pitch resolutions of about 30–40 nm, which are still about 20–30 times greater than the utilized wavelength (1.24 nm for 1000 eV X‐rays), leaving much room for improvement. Higher resolutions down to about 15–9 nm half‐pitch have been reported for FZPs fabricated following unconventional and complex double patterning, zone‐doubling and stacking techniques often correlated with strongly reduced diffraction efficiencies 1, 16, 17, 19, 20. Typical diffraction efficiencies for standard commercial zone plates at soft X‐rays are about 5–10% but rapidly decrease toward higher energy X‐rays.…”

Section: Introductionmentioning

confidence: 99%

3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

et al. 2018

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Focusing X‐rays to single nanometer dimensions is impeded by the lack of high‐quality, high‐resolution optics. Challenges in fabricating high aspect ratio 3D nanostructures limit the quality and the resolution. Multilayer zone plates target this challenge by offering virtually unlimited and freely selectable aspect ratios. Here, a full‐ceramic zone plate is fabricated via atomic layer deposition of multilayers over optical quality glass fibers and subsequent focused ion beam slicing. The quality of the multilayers is confirmed up to an aspect ratio of 500 with zones as thin as 25 nm. Focusing performance of the fabricated zone plate is tested toward the high‐energy limit of a soft X‐ray scanning transmission microscope, achieving a 15 nm half‐pitch cut‐off resolution. Sources of adverse influences are identified, and effective routes for improving the zone plate performance are elaborated, paving a clear path toward using multilayer zone plates in high‐energy X‐ray microscopy. Finally, a new fabrication concept is introduced for making zone plates with precisely tilted zones, targeting even higher resolutions.

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“…Much work has already been done developing different photon-based imaging techniques and schemes, according to the Rayleigh criterion, which states that the light of shorter wavelength improves the diffraction-limited spatial resolution. Some examples of this demonstrate the use of synchrotronbased sources [4] reaching spatial resolution of ~10 nm [5] or using 13.5 nm wavelength for lithography-related such system to a few images per day [17,18]. Much more rapid exposures of 60 s were required to image objects with 40-nm spatial resolution, employing a high average power laser system for plasma generation, occupying, however, several optical tables [19], which in turn limit future possibility of commercialization.…”

Section: Introductionmentioning

confidence: 99%

A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

et al. 2016

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research, such as mask inspection [6,7]-reaching 22-nm half pitch resolution or lithography [8], as well as free electron lasers [9] for coherent diffraction imaging (CDI) schemes [10]. These facilities, although state of the art and dedicated to cutting-edge science experiments, are not "user friendly," with limited user access and require high maintenance costs, because of their scale and complexity. Another approach is to use tabletop high-order harmonic (HHG) sources [11] for sub-100-nm spatial resolution imaging [12]; however, typical 10 −6 -10 −5 HHG conversion efficiency is very low and often does not allow for a proper reconstruction [13], the system is very complicated, and typical CDI requires time-consuming numerical data processing. Ptychographic schemes, although providing very high spatial resolution, are serial in nature, extensively time-consuming and computationally demanding.To partially overcome these limitations, other compact EUV sources, such as discharge [14], Z-pinch [15] or laserproduced plasma sources [16], coupled to zone plates or Schwarzschild mirrors, were used. The first one is compact and shows very good spatial resolution, but requires often (~30 k pulses) capillary replacements, the second one demonstrates quite low performance in terms of spatial resolution and field of view exploiting inadequate mode of imaging for lithographic mask inspection, while the last one requires debris mitigation schemes.The use of compact, short-wavelength sources often does not allow for high signal-to-noise ratio image acquisition. An example of that are recent developments in soft X-ray (SXR) microscopy in so-called water window, such as a compact soft X-ray microscope based on a single nitrogen gas jet, capable of resolving features ~100 nm later improved to ~50 nm in size providing high spatial resolution; however, the exposure time for Siemens star test pattern was equal to 1-2 h, limiting the usability of Abstract A compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25-75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed.

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Real space soft x-ray imaging at 10 nm spatial resolution

Cited by 241 publications

References 21 publications

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

3D Nanofabrication of High‐Resolution Multilayer Fresnel Zone Plates

A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

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