Real-Time Ellipsometry at High and Low Temperatures

Mukherjee, Deshabrato; Petrik, P.

doi:10.1021/acsomega.2c07438

Cited by 8 publications

(6 citation statements)

References 161 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The key use of ellipsometry is to evaluate the refractive index and thickness of a supported coating or film [1][2][3]. Due to historic reasons, the change in the polarization ellipse r r where r p ( ) and r s ( ) are the p and s reflection amplitudes, which can be directly calculated through numerical solution of the Fresnel and Maxwell's equations [4,5].…”

Section: Introductionmentioning

confidence: 99%

Tackling the inverse problem in ellipsometry: analytic expressions for supported coatings with nonuniform refractive index profiles in the thin film and weak contrast limits

Toomey

2024

Phys. Scr.

View full text Add to dashboard Cite

Ellipsometry is a powerful tool for the evaluation of the refractive index profile of a film or coating supported on a solid substrate. A well-acknowledged problem; however, is the inverse problem: Given a set of data, under what conditions can a refractive index profile be determined unambiguously? To this end, a series expansion of the Abeles matrix method has been applied to an arbitrary refractive index profile to determine analytic expressions of the ellipsometric ratio . Two types of expressions are found: The thin film limit in which the film thickness L is much less than the wavelength of the incident light beam ( ) and the weak contrast limit in which the refractive index of the coating is very near the refractive index of the supporting substrate. In the thin film limit, the first two terms in the series expansion are relatively straight-forward, and they depend on two types of integrals involving the difference between the dielectric profile of the coating and the dielectric constant of the substrate. While higher order terms are possible, they are quite convoluted and do not assist in the inverse problem. In the weak contrast limit, however, the series expansion of depends on the moments of the difference between the dielectric profile of the coating and the dielectric constant of the substrate, allowing an analytic expression that applies to coatings that are even much larger than the wavelength of the incident light beam. The expressions associated with both limits are verified through comparison to the numerical evaluation of with the Abeles matrix method. The results demonstrate that through judicious selection of the substrate refractive index and incident wavelength, conditions can be created that permit critical insights into the inverse problem for either thin coatings or for coatings that are very near the refractive index of the substrate.

show abstract

Section: Introductionmentioning

confidence: 99%

Tackling the inverse problem in ellipsometry: analytic expressions for supported coatings with nonuniform refractive index profiles in the thin film and weak contrast limits

Toomey

2024

Phys. Scr.

View full text Add to dashboard Cite

show abstract

“…For the spectral detection, an ellipsometer often uses a grating-based spectrometer 13 , 14 . The combination of fast polarization modulation and multichannel spectral detection have enabled real time ellipsometry measurements 3 , 15 , 16 towards various applications 17 . Nonetheless, a typical spectroscopic ellipsometer, as shown in Fig.…”

Section: Introductionmentioning

confidence: 99%

Metasurface array for single-shot spectroscopic ellipsometry

Wen,

Xue,

Wang

et al. 2024

Light Sci Appl

View full text Add to dashboard Cite

Spectroscopic ellipsometry is a potent method that is widely adopted for the measurement of thin film thickness and refractive index. Most conventional ellipsometers utilize mechanically rotating polarizers and grating-based spectrometers for spectropolarimetric detection. Here, we demonstrated a compact metasurface array-based spectroscopic ellipsometry system that allows single-shot spectropolarimetric detection and accurate determination of thin film properties without any mechanical movement. The silicon-based metasurface array with a highly anisotropic and diverse spectral response is combined with iterative optimization to reconstruct the full Stokes polarization spectrum of the light reflected by the thin film with high fidelity. Subsequently, the film thickness and refractive index can be determined by fitting the measurement results to a proper material model with high accuracy. Our approach opens up a new pathway towards a compact and robust spectroscopic ellipsometry system for the high throughput measurement of thin film properties.

show abstract

“…Understanding the polarization response of an object of interest can reveal characteristic features in the sample's structure and/or behavior, e.g., the birefringence of crystals and biotissues, 1,2 polarization selectivity in reflection/transmission of periodic structures, [3][4][5] and chemical composition via detection of chiral proteins, molecules, or their assemblies. 6,7 The knowledge about the object under study that can be thus acquired is then widely employed for optical biomedical diagnostics, [8][9][10] the control of nonlinear phenomena, 11 fundamental studies, 12 technical characterization, 13,14 and remote sensing, 15 as well as for currently expanding quantum technologies in the fields of communication, computing, and metrology. 16,17 A comprehensive characterization in terms of polarization is enabled by the well-acknowledged techniques of classical optics-Stokes and Mueller polarimetry 18 -which are based on projective analysis of the polarization state or its change.…”

Section: Introductionmentioning

confidence: 99%

Nonlocal quantum differentiation between polarization objects using entanglement

Besaga,

Zhang,

Vega

et al. 2024

APL Photonics

View full text Add to dashboard Cite

For a wide range of applications, a fast, non-destructive, remote, and sensitive identification of samples with predefined characteristics is preferred instead of their full characterization. In this work, we report on the experimental implementation of a nonlocal quantum measurement scheme, which allows for differentiation among samples out of a predefined set of transparent and birefringent objects in a distant optical channel. The measurement is enabled by application of polarization-entangled photon pairs and is based on remote state preparation. On an example set of more than 80 objects characterized by different Mueller matrices, we show that only two coincidence measurements are already sufficient for successful discrimination. The number of measurements needed for sample differentiation is significantly decreased compared to a comprehensive polarimetric analysis. Our results demonstrate the potential of this polarization detection method for polarimetric applications in biomedical diagnostics, remote sensing, and other classification/detection tasks.

show abstract

Real-Time Ellipsometry at High and Low Temperatures

Cited by 8 publications

References 161 publications

Tackling the inverse problem in ellipsometry: analytic expressions for supported coatings with nonuniform refractive index profiles in the thin film and weak contrast limits

Tackling the inverse problem in ellipsometry: analytic expressions for supported coatings with nonuniform refractive index profiles in the thin film and weak contrast limits

Metasurface array for single-shot spectroscopic ellipsometry

Nonlocal quantum differentiation between polarization objects using entanglement

Contact Info

Product

Resources

About