2013
DOI: 10.1016/j.cap.2012.06.012
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Real time feedback control of plasma density using a floating probe in semiconductor processing

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Cited by 5 publications
(1 citation statement)
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“…13) The feasibility of feedback control of plasma density based on continuous FHP measurement has been experimentally verified to achieve advanced plasmaprocess control. 14) Since the FHP method can measure parameters even when there is a dielectric on the probe surface, it has attracted interest as a tool for parameter monitoring in reactive plasmas. To establish reactive plasma monitoring, FHP measurements with dielectric-coated probes were compared with the DC-based probe without the dielectric coating.…”
Section: Introductionmentioning
confidence: 99%
“…13) The feasibility of feedback control of plasma density based on continuous FHP measurement has been experimentally verified to achieve advanced plasmaprocess control. 14) Since the FHP method can measure parameters even when there is a dielectric on the probe surface, it has attracted interest as a tool for parameter monitoring in reactive plasmas. To establish reactive plasma monitoring, FHP measurements with dielectric-coated probes were compared with the DC-based probe without the dielectric coating.…”
Section: Introductionmentioning
confidence: 99%