Search citation statements
Paper Sections
Citation Types
Year Published
Publication Types
Relationship
Authors
Journals
Large-area gratings play a critical role in various fields such as astronomical observations, laser fusion, and precision measurements, with an increasingly urgent demand for the fabrication of meter-scale gratings. Interference lithography (IL) offers the capability to produce high-quality gratings and holds significant potential for scaling up grating sizes. The stability of the exposure light field significantly affects the processing quality. Therefore, this paper proposes a fringe locking technique based on multiple reference gratings.In the dual-beam interference lithography setup with large-aperture optics, a reference grating is used to monitor the exposure field. The reference fringes are recorded by a CCD camera, and the drift values are calculated using a cross-correlation method. These values are used to generate the control signals, which actuate the motion mechanisms to dynamically adjust the phase and period of interference field. However, relying on a single reference grating is insufficient to capture the conditions across the entire exposure field.Therefore, we conducted an analysis of the errors across the entire exposure field and identified period error as the primary cause of this phenomenon. To address this, fringe patterns from two reference gratings are used to monitor periodic variations in the interference field. The feedback calculated by these variations is used to adjust the motion mechanism. altering the angle between the two beams to achieve periodic compensation. Experimental results show that after implementing periodic compensation, the fluctuation RMS of the interference fringes decreased from 0.24λ to 0.06λ, demonstrating significant improvement.
Large-area gratings play a critical role in various fields such as astronomical observations, laser fusion, and precision measurements, with an increasingly urgent demand for the fabrication of meter-scale gratings. Interference lithography (IL) offers the capability to produce high-quality gratings and holds significant potential for scaling up grating sizes. The stability of the exposure light field significantly affects the processing quality. Therefore, this paper proposes a fringe locking technique based on multiple reference gratings.In the dual-beam interference lithography setup with large-aperture optics, a reference grating is used to monitor the exposure field. The reference fringes are recorded by a CCD camera, and the drift values are calculated using a cross-correlation method. These values are used to generate the control signals, which actuate the motion mechanisms to dynamically adjust the phase and period of interference field. However, relying on a single reference grating is insufficient to capture the conditions across the entire exposure field.Therefore, we conducted an analysis of the errors across the entire exposure field and identified period error as the primary cause of this phenomenon. To address this, fringe patterns from two reference gratings are used to monitor periodic variations in the interference field. The feedback calculated by these variations is used to adjust the motion mechanism. altering the angle between the two beams to achieve periodic compensation. Experimental results show that after implementing periodic compensation, the fluctuation RMS of the interference fringes decreased from 0.24λ to 0.06λ, demonstrating significant improvement.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.
customersupport@researchsolutions.com
10624 S. Eastern Ave., Ste. A-614
Henderson, NV 89052, USA
This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.
Copyright © 2024 scite LLC. All rights reserved.
Made with 💙 for researchers
Part of the Research Solutions Family.