2018
DOI: 10.1063/1.5023015
|View full text |Cite
|
Sign up to set email alerts
|

Realization of forming-free Ag/ZrO2-based threshold selector with high selectivity by optimizing film thickness and scaling down electrode size

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
4
0

Year Published

2019
2019
2022
2022

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(4 citation statements)
references
References 21 publications
0
4
0
Order By: Relevance
“…For CBRAM cells, nonvolatility is important for attaining stable memory switching characteristics. However, as reported in recent research studies, an exceptional phenomenon called electrochemical metallization (ECM) comprises volatile threshold switching that occurs under low compliance current operation. ,, Volatile threshold switching is a phenomenon in which resistance change occurs from a high-resistance state (HRS) to a low-resistance state (LRS) by the applied voltage upon the threshold and returns to the HRS without any reset process. This occurs because of the metallic filament’s easily dissoluble nature to minimize its interfacial energy and has been observed in several materials. ECM threshold switches have gained significant interest because of their unique volatile threshold switching properties while also maintaining several merits of the CBRAMs, such as great scalability, a high ON/OFF ratio, and great compatibility with CMOS technology.…”
Section: Introductionmentioning
confidence: 99%
See 3 more Smart Citations
“…For CBRAM cells, nonvolatility is important for attaining stable memory switching characteristics. However, as reported in recent research studies, an exceptional phenomenon called electrochemical metallization (ECM) comprises volatile threshold switching that occurs under low compliance current operation. ,, Volatile threshold switching is a phenomenon in which resistance change occurs from a high-resistance state (HRS) to a low-resistance state (LRS) by the applied voltage upon the threshold and returns to the HRS without any reset process. This occurs because of the metallic filament’s easily dissoluble nature to minimize its interfacial energy and has been observed in several materials. ECM threshold switches have gained significant interest because of their unique volatile threshold switching properties while also maintaining several merits of the CBRAMs, such as great scalability, a high ON/OFF ratio, and great compatibility with CMOS technology.…”
Section: Introductionmentioning
confidence: 99%
“…However, as reported in recent research studies, an exceptional phenomenon called electrochemical metallization (ECM) comprises volatile threshold switching that occurs under low compliance current operation. ,, Volatile threshold switching is a phenomenon in which resistance change occurs from a high-resistance state (HRS) to a low-resistance state (LRS) by the applied voltage upon the threshold and returns to the HRS without any reset process. This occurs because of the metallic filament’s easily dissoluble nature to minimize its interfacial energy and has been observed in several materials. ECM threshold switches have gained significant interest because of their unique volatile threshold switching properties while also maintaining several merits of the CBRAMs, such as great scalability, a high ON/OFF ratio, and great compatibility with CMOS technology. ECM threshold switches can be used for enhancing the subthreshold slope of the conventional MOS field effect transistor , and are spotlighted as a selector device for a crossbar memory array, which is necessary for increasing the memory array size. Additionally, the application to the artificial synaptic device, which mimics synapses found in the human brain, has great potential for neuromorphic computing research studies. , However, the unreliable set operation for an ECM threshold switch, due to its inherent filament randomness, is a problem that hinders extension of its application.…”
Section: Introductionmentioning
confidence: 99%
See 2 more Smart Citations