2005
DOI: 10.1088/1367-2630/7/1/255
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Realization of optical superlens imaging below the diffraction limit

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Cited by 116 publications
(93 citation statements)
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“…The reader may note, however, that such explanations did not go uncontested in literature [65]. On the other hand, as mentioned above, Fang et al [60] and, subsequently, Lee et al [66] experimentally demonstrated a spatial resolution of 89 nm and 60 nm, respectively, at a wavelength of 365 nm using a 35 nm-thick silver slab and achieving a wavelength/resolution ratio of 6. This was later overcome by a SiC lens that reached a factor of 20 due to smaller losses [67].…”
Section: Negative Refraction and Sub-wavelength Resolution Imaging Anmentioning
confidence: 97%
“…The reader may note, however, that such explanations did not go uncontested in literature [65]. On the other hand, as mentioned above, Fang et al [60] and, subsequently, Lee et al [66] experimentally demonstrated a spatial resolution of 89 nm and 60 nm, respectively, at a wavelength of 365 nm using a 35 nm-thick silver slab and achieving a wavelength/resolution ratio of 6. This was later overcome by a SiC lens that reached a factor of 20 due to smaller losses [67].…”
Section: Negative Refraction and Sub-wavelength Resolution Imaging Anmentioning
confidence: 97%
“…This unusual enhancement is attributed to the excitation of SPs on the metal surface which dramatically enhances the optical throughput via the sub-wavelength aperture. This opens up a broad range of possibilities and applications from nanolithography [134][135][136][137] and imaging [138][139][140][141] to chemical sensing [142][143][144] and biophysics [145,146]. For instance, the use of SPs assisted mask could overcome the low throughput issue of photolithography through subwavelength aperture [134].…”
Section: Optics and Photonicsmentioning
confidence: 99%
“…For instance, the use of SPs assisted mask could overcome the low throughput issue of photolithography through subwavelength aperture [134]. Superlens, an ultrahigh-resolution lens that goes beyond the diffraction limit, is also attributed to the enhanced electric field through surface plasmon resonance while the resolution of the image is preserved resulting in a high-resolution imaging [138,139]. For the fabrication of nanostructures, most of the time, electron beam lithography or focused ion beam lithography are used to fabricate high-resolution patterns such as nanoscale hole arrays [127,134], bull's eye structures [132] and plasmonic lens [137].…”
Section: Optics and Photonicsmentioning
confidence: 99%
“…Many SPP-based superlenses were presented recently [7][8][9] as well as resonance immunosensors [10], nanobiosensors [11] and nanoprobes [12]. One of the superlenses consists of a silver film coating on glass with some corrugations [13].…”
Section: Introductionmentioning
confidence: 99%