2018
DOI: 10.1021/acsnano.7b07059
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Realizing Large-Scale, Electronic-Grade Two-Dimensional Semiconductors

Abstract: Atomically thin transition metal dichalcogenides (TMDs) are of interest for next-generation electronics and optoelectronics. Here, we demonstrate device-ready synthetic tungsten diselenide (WSe) via metal-organic chemical vapor deposition and provide key insights into the phenomena that control the properties of large-area, epitaxial TMDs. When epitaxy is achieved, the sapphire surface reconstructs, leading to strong 2D/3D (i.e., TMD/substrate) interactions that impact carrier transport. Furthermore, we demons… Show more

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Cited by 196 publications
(270 citation statements)
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References 53 publications
(125 reference statements)
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“…[18] They are among the most abundant point defects in our samples but their density varies considerably between different CVD preparations. Similar STM contrast has been observed in CVD-grown MoS 2 [19], MOCVD-and MBE-grown WSe 2 [20,21], MBE-grown MoSe 2 [21] and natural bulk MoS 2 (0001) [22]. Some of these reports suggest that the observed defect might be charged [18,21,22] but their chemical origin remains unclear.…”
supporting
confidence: 68%
“…[18] They are among the most abundant point defects in our samples but their density varies considerably between different CVD preparations. Similar STM contrast has been observed in CVD-grown MoS 2 [19], MOCVD-and MBE-grown WSe 2 [20,21], MBE-grown MoSe 2 [21] and natural bulk MoS 2 (0001) [22]. Some of these reports suggest that the observed defect might be charged [18,21,22] but their chemical origin remains unclear.…”
supporting
confidence: 68%
“…On the application side, scaling of micrometer-sized proof-of-principle devices to macroscopic dimensions remains a challenge. Wafer-scale synthesis of uniform TMD layers has been achieved [157,158], but the monolithic growth of VdW heterostructures is difficult.…”
Section: Challengesmentioning
confidence: 99%
“…In addition, samples prepared by selective etching suffer from defects generated during the etching process and large thickness distributions (16,17). These types of 2D TMNs are not suitable for high performance electronic and optoelectronic device applications which often require 2D crystals with decent area (>10 micrometers of lateral size), quality, and deposition on solid state substrates (18,19). Conventional 2D materials such as graphene and transition metal dichalcogenides (TMDs) produced using chemical vapor deposition (CVD) have made significant progress in advancing the development of electronic devices (20)(21)(22).…”
Section: Introductionmentioning
confidence: 99%