Recent Advances in Chemical Vapor Deposition

Abstract

Chemical vapor deposition (CVD) represents the method-of-choice for thin film growth, as well as nanomaterials such as carbon nanotubes. Distinct advantages of this technique include low cost, and strict control over the resultant film stoichiometry, morphology, and thickness. The most critical component of a CVD process is the precursor that is employed. Hence, there has been a continuing interest in the development of new CVD precursors that would be useful for a range of thin film applications. This review will highlight recent advances in CVD precursor design, including both single-source and co-reactant precursor systems. Whereas the earliest examples of CVD precursors included metal β-diketonates, this review will feature novel ligand systems that have already been used, or have been proposed for future MOCVD applications. In addition, we will describe new methodologies that have improved the deposition process through innovations in precursor delivery and decomposition within the CVD system. These latter developments have extended the scope of CVD applications to include precursors that are not particularly volatile, and have allowed for a reduction in the level of impurities in the growing film.

Thin films for micro solid oxide fuel cells

“…For an extensive review on the basics of the CVD process as well as some application examples, the reader is referred to [46] and for a very recent review to [47]; this review is restricted to examples of fuel cell materials deposited by CVD.…”

Alcohol‐Assisted CVD of Silver Using Commercially Available Precursors

“…[9,[15][16][17][18][19][20][21] However, recent developments in the precursor delivery system circumvent the necessity of thermally stable and highly volatile precursors. [22] Among these processes are aerosol-assisted (AA) CVD, which uses a solvent that does not decompose on the substrate during the deposition, [23] and direct liquid injection (DLI) CVD [2] which employs liquid precursors.…”

A facile and environment-friendly method to fabricate thin electrolyte films for solid oxide fuel cells

“…A variety of thin film deposition methods have demonstrated the feasibility of synthesizing YSZ films ranging from 500 nm to 2 m, including chemical vapor deposition (CVD) [20], pulsed laser deposition (PLD) [21], and atomic layer deposition (ALD) [22], etc. However, problems exist for each method.…”

“…However, problems exist for each method. For example, CVD method requires a high reaction temperature and produces corrosive gases during the deposition process [20]. The thin films 0925-8388/$ -see front matter © 2011 Elsevier B.V. All rights reserved.…”