2005
DOI: 10.1007/s00216-004-2847-z
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Recent advances in microcontact printing

Abstract: Microcontact printing is a remarkable surface patterning technique. Developed about 10 years ago, it has triggered enormous interest from the surface science community, as well as from engineers and biologists. The last five years have been rich in improvements to the microcontact printing process itself, as well as in new technical innovations, many designed to suit new applications. In this review, we describe the evolution of microcontact printing over the past five years. The review is categorized into thr… Show more

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Cited by 267 publications
(196 citation statements)
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“…We then microstamped the coverslips with 150-to 200-m-diameter circular islands of collagen adsorbed onto a polydimethylsiloxane (PDMS) stamp. The microstamp was fabricated by molding PDMS on thick photoresist patterned using photolithography and microcontact printing techniques (Quist et al, 2005;Falconnet et al, 2006). In brief, SU-8 2015 photoresist (MicroChem, Newton, MA) was dispensed on a silicon wafer and spun into a thin film using a spin coater (WS-400B-6NPP-Lite; Laurell Technologies, North Wales, PA) at 3000 rpm for 1 min to produce a film thickness of ϳ15 m. Prebake of photoresist by heating to 95°C for 3 min on a hotplate was followed by exposure to UV light (US-KVB30D; Computronics Corporation, Bentley, Australia) through a 5080 dpi transparency photomask.…”
Section: Methodsmentioning
confidence: 99%
“…We then microstamped the coverslips with 150-to 200-m-diameter circular islands of collagen adsorbed onto a polydimethylsiloxane (PDMS) stamp. The microstamp was fabricated by molding PDMS on thick photoresist patterned using photolithography and microcontact printing techniques (Quist et al, 2005;Falconnet et al, 2006). In brief, SU-8 2015 photoresist (MicroChem, Newton, MA) was dispensed on a silicon wafer and spun into a thin film using a spin coater (WS-400B-6NPP-Lite; Laurell Technologies, North Wales, PA) at 3000 rpm for 1 min to produce a film thickness of ϳ15 m. Prebake of photoresist by heating to 95°C for 3 min on a hotplate was followed by exposure to UV light (US-KVB30D; Computronics Corporation, Bentley, Australia) through a 5080 dpi transparency photomask.…”
Section: Methodsmentioning
confidence: 99%
“…1 Self-assembly methods 1,2 are generally limited to creation of uniform 2D films. 3,4 Printing methods, 5,6 which have the potential for organizing nanostructures through creation of chemical templates, can rarely achieve patterning below 50 nm, and then controlling orientations of individual nanostructures is difficult. One approach to achieving higher density of functionality and shorter range order is to use macromolecular complexes -such as virions -as programmable building blocks, either for synthesis of nanoparticles and nanowires or for precise placement of molecular moieties exhibiting optical and electronic functions.…”
Section: Introductionmentioning
confidence: 99%
“…These non-lithographic techniques require minimal monetary investment (clean room not necessary), can be conducted under normal bench top laboratory conditions, and are conceptually simple to fabricate. Some of the diverse fabrication methods known collectively as soft lithography include: replica molding (Xia et al, 1997), micromolding in capillaries-MIMIC (Zhang et al, 2002), microcontact printing-μCP (Quist et al, 2005), and microtransfer molding-μTM (Zhao et al, 1996). Schematic illustrations of some these procedures are depicted in Fig.…”
Section: Soft Lithographymentioning
confidence: 99%