“…Another pathway is to apply external forces to align the crystal growth direction at the same time when the semiconductor undergoes crystallization. 94 This gives rise to miscellaneous alignment methods, such as air force navigation, 95,96 pinning confinement, 97,98 solution shearing, [99][100][101][102][103][104] blade coating, 105,106 zone casting, [107][108][109] and selective patterning. [110][111][112] Regardless of polymer mixing or external alignment, it is still imperative to control the various factors that critically influence semiconductor crystallization.…”