Recent advances in surface processing with the filtered DC vacuum-arc plasma

Ryabchikov, A. I.; Ryabchikov, I.A.; Stepanov, I.B.; Sivin, D. O.

doi:10.1016/j.vacuum.2005.01.066

Cited by 27 publications

(13 citation statements)

References 2 publications

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“…The plasma filter used in this paper based on the principle of avoiding line-of-sight between cathode and substrate. The efficiency of plasma transmission through this filter could be more than 30% [18]. Similarly principle also used in Venetian Blind Filters, where the plasma transmission ratio of 20% has been achieved [19,20].…”

Section: Ti-al-n Coatings Depositionmentioning

confidence: 83%

The Formation of Composite Ti-Al-N Coatings Using Filtered Vacuum Arc Deposition with Separate Cathodes

Шулепов

Kashkarov

Stepanov

et al. 2017

Metals

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Ti-Al-N coatings were deposited on high-speed steel substrates by filtered vacuum arc deposition (FVAD) during evaporation of aluminum and titanium cathodes. Distribution of elements, phase composition, and mechanical properties of Ti-Al-N coatings were investigated using Auger electron spectroscopy (AES), X-ray diffraction (XRD), transmission electron microscopy (TEM) and nanoindentation, respectively. Additionally, tribological tests and scratch tests of the coatings were performed. The stoichiometry of the coating changes from Ti 0.6 Al 0.4 N to Ti 0.48 Al 0.52 N with increasing aluminum arc current from 70 A to 90 A, respectively. XRD and TEM showed only face-centered cubic Ti-Al-N phase with preferred orientation of the crystallites in (220) direction with respect to the sample normal and without precipitates of AlN or intermetallics inside the coatings. Incorporation of Al into the TiN lattice caused shifting of the (220) reflex to a higher 2θ angle with increasing Al content. Low content and size of microdroplets were obtained using coaxial plasma filters, which provides good mechanical and tribological properties of the coatings. The highest value of microhardness (36 GPa) and the best wear-resistance were achieved for the coating with higher Al content, thus for Ti 0.48 Al 0.52 N. These coatings exhibit good adhesive properties up to 30 N load in the scratch tests.

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Section: Ti-al-n Coatings Depositionmentioning

confidence: 83%

The Formation of Composite Ti-Al-N Coatings Using Filtered Vacuum Arc Deposition with Separate Cathodes

Шулепов

Kashkarov

Stepanov

et al. 2017

Metals

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“…The cathodes were set at an angle of 120 • [15]. The system was equipped with toroidal-core electromagnetic droplet phase separators [16]. The substrate was rotated in order to ensure the most uniform m deposition of coatings.…”

Section: Methodsmentioning

confidence: 99%

Thermal stability and chemical resistance of (Ti,Al)N-Cu and (Ti,Al)N-Ni metal-ceramic nanostructured coatings

Белов

Блинков

Volkhonskii

et al. 2016

Applied Surface Science

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“…Experimental installation for vacuum arc filtered plasma deposition presents a vacuum chamber with 0.5 m 3 volume, on which a vacuum arc plasma generator equipped with plasma filter for microparticles removal is installed [21]. Metal and dielectric samples were placed on the conductive holder both in case of application of vacuum arc plasma and ablation plasma.…”

Section: Experimental Installationsmentioning

confidence: 99%

“…Metal plasma-immersion ion implantation and deposition, named as MePIIID [11], was investigated for pulsed metal plasma with rather short bias potential pulse durations (3-10 µs) and duty cycle of 10-50%. The regularities of attendant processes for the high-concentration ion implantation regime with surface ion sputtering compensation by plasma deposition using the plasma-immersion approach were investigated in [20][21][22][23]. The arc discharge was pulsed with duration from 50 up to 400 µs.…”

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confidence: 99%

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Coating deposition using vacuum arc and ablation metal plasma

Ryabchikov¹,

Matvienko²,

Stepanov³

2009

Surface and Coatings Technology

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-An innovative concept in the development of advanced coating deposition and ion implantation method including an application of filtered DC metal plasma or ablation plasma and highfrequency short-pulsed negative bias voltage with a duty factor in the range 10-99% are considered.It was shown that plasma based ion implantation as well as ion-assisted coating deposition may be realized for metal and dielectric samples by variation of negative bias potential in the range of 0-4 · 10 3 V, pulse repetition rate smoothly adjusted in the range of (2-4.4) · 10 5 pps and pulse duration in the range of 0.5-2 µs.It was experimentally shown that at coating deposition from ablation plasma obtained by high intensity ion beam (j = 300 A/cm 2 , E = 350 keV, τ = 90 ns) influence on the target, the breakdown of the plasma sheet occurred at dc negative bias potential on a substrate more than 60 V. The transfer to 0.5 µs duration pulses allowed us to increase the bias potential up to -4 kV.

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Recent advances in surface processing with the filtered DC vacuum-arc plasma

Cited by 27 publications

References 2 publications

The Formation of Composite Ti-Al-N Coatings Using Filtered Vacuum Arc Deposition with Separate Cathodes

The Formation of Composite Ti-Al-N Coatings Using Filtered Vacuum Arc Deposition with Separate Cathodes

Thermal stability and chemical resistance of (Ti,Al)N-Cu and (Ti,Al)N-Ni metal-ceramic nanostructured coatings

Coating deposition using vacuum arc and ablation metal plasma

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