Comprehensive Nanoscience and Nanotechnology 2019
DOI: 10.1016/b978-0-12-803581-8.10432-1
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Recent Development in Focused Ion Beam Nanofabrication

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Cited by 5 publications
(2 citation statements)
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“…Focused ion/electron beam induced deposition (FIBID/ FEBID) is a handy tool for nanofabrication, nanopatterning and engineering of the devices at the nanoscale [1][2][3][4][5]. It is successfully utilized to fabricate nanodevices and patterns with different functionalities such as SQUID devices [6,7], superconducting proximity devices [8,9], 3D structures with vertical alignment [10,11] etc.…”
Section: Introductionmentioning
confidence: 99%
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“…Focused ion/electron beam induced deposition (FIBID/ FEBID) is a handy tool for nanofabrication, nanopatterning and engineering of the devices at the nanoscale [1][2][3][4][5]. It is successfully utilized to fabricate nanodevices and patterns with different functionalities such as SQUID devices [6,7], superconducting proximity devices [8,9], 3D structures with vertical alignment [10,11] etc.…”
Section: Introductionmentioning
confidence: 99%
“…It is successfully utilized to fabricate nanodevices and patterns with different functionalities such as SQUID devices [6,7], superconducting proximity devices [8,9], 3D structures with vertical alignment [10,11] etc. Compared to other nanofabrication techniques such as electron beam lithography (EBL) and optical lithography techniques, FIBID/FEBID offers advantages as being a single step process devoid of use of masks/resist for the growth of nanodevices [1][2][3][4][5]12]. The typical resolution offered by gallium ions (Ga + ) ions in FIB is in the range of ∼30 nm [4], while for electrons and helium ions (He + ) it is in the range of ∼10 nm and less [5].…”
Section: Introductionmentioning
confidence: 99%