Recent Development of Graphitic Carbon Nitride-Based Photocatalyst for Environmental Pollution Remediation

Abstract

Globalization today has helped fuel the global socioeconomic growth of the world and reshaping the growth of the industries. While the development had been remarkable, the rapid rise of industrialization had provoked the sustainable chain of diversity which is reflected by rising pollution level, particularly on the water pollution. On account of the cutting edge of water security issue, engineering photocatalytic material remains crucial in finding new ways to combat the challenge of water pollution through photocatalytic pollutants degradation while at the same time acts as the frontlines for energy conversion and environmental protection. To date, graphitic carbon nitride, g-C 3 N 4 had emerged as a promising material of interest in photocatalytic application due to its appealing characteristics such as excellent optical properties and high physiochemical and thermal stability. This chapter will comprehensively discuss an insight into the most recent progress in synthesis, properties and the photocatalytic application of g-C 3 N 4 , particularly in environmental pollution remediation. Special emphasis is also placed on the most recent strategies for enhancing the photocatalytic performance of the g-C 3 N 4 photocatalyst. Finally, the future directions and perspectives will be presented.

Optimization Method Based on Simplex for Surface Area Improved Photocatalytic Performance of g-C3N4

“…Simplex optimization method). A reference g-C 3 N 4 sample denoted as MRref was synthesized by using DCDA and synthesis parameters (550, 300 °C/h, 4 h) from the literature. , Additionally, a commercially available g-C 3 N 4 sample (TCI, TCI Chemicals) was used for comparison in selected characterization.…”

Recent advancements in the fabrication and photocatalytic applications of graphitic carbon nitride-tungsten oxide nanocomposites

“…Based on the symmetry of the tri-s-triazine structure, 3 nonequivalent N atoms and 2 nonequivalent C atoms are present, indicated by (N1-N2-N3/C1-C2, respectively) with N1-C1, C1-N2, N2-C2, and N2-C3 bond lengths of 0.147 nm, 0.134 nm, 0.133 nm, and 0.139 nm, respectively. 69,74,75 Moreover, the bulk structure of g-C 3 N 4 is formed through multilayer stacking, known as 'AB-stacking'. The interaction energy between adjacent layers measures 0.036 eV Å −2 , indicating the presence of van der Waals forces (weak p-p interactions) between the layers.…”

“…Based on the symmetry of the tri- s -triazine structure, 3 nonequivalent N atoms and 2 nonequivalent C atoms are present, indicated by (N1–N2–N3/C1–C2, respectively) with N1–C1, C1–N2, N2–C2, and N2–C3 bond lengths of 0.147 nm, 0.134 nm, 0.133 nm, and 0.139 nm, respectively. 69,74,75…”

Europium-doped g-C3N4: an efficient remover of textile dyes from water

“…The detail mechanism behind the UV photon assisted photo-catalysis may be associated with the following steps: when UV photons falls on the sample the samples gets excited. Photo-excited electrons thus generated are migrated from valance band to conduction band, creating photogenerated holes in the valance band [43].…”